In situ real time monitoring of nanosecond imprint process

Qiangfei Xia, Zhaoning Yu, He Gao, Stephen Y. Chou

Research output: Contribution to journalArticlepeer-review

11 Scopus citations

Abstract

Using a real time imprint monitoring system (RIMS), the authors measured the process time for laser assisted nanoimprint lithography to be about 200 ns. They found that during this short period of time, the mold had been fully pressed into the resist, resulting in a full pattern transfer with high fidelity. Their results also demonstrated the capability of RIMS for monitoring an ultrafast imprint process.

Original languageEnglish (US)
Article number073107
JournalApplied Physics Letters
Volume89
Issue number7
DOIs
StatePublished - 2006

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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