In situ real time monitoring of nanosecond imprint process

Qiangfei Xia; Zhaoning Yu; He Gao; Stephen Y. Chou

doi:10.1063/1.2335952

In situ real time monitoring of nanosecond imprint process

Qiangfei Xia, Zhaoning Yu, He Gao, Stephen Y. Chou

Research output: Contribution to journal › Article › peer-review

12 Scopus citations

Abstract

Using a real time imprint monitoring system (RIMS), the authors measured the process time for laser assisted nanoimprint lithography to be about 200 ns. They found that during this short period of time, the mold had been fully pressed into the resist, resulting in a full pattern transfer with high fidelity. Their results also demonstrated the capability of RIMS for monitoring an ultrafast imprint process.

Original language	English (US)
Article number	073107
Journal	Applied Physics Letters
Volume	89
Issue number	7
DOIs	https://doi.org/10.1063/1.2335952
State	Published - 2006

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.2335952

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title = "In situ real time monitoring of nanosecond imprint process",

abstract = "Using a real time imprint monitoring system (RIMS), the authors measured the process time for laser assisted nanoimprint lithography to be about 200 ns. They found that during this short period of time, the mold had been fully pressed into the resist, resulting in a full pattern transfer with high fidelity. Their results also demonstrated the capability of RIMS for monitoring an ultrafast imprint process.",

author = "Qiangfei Xia and Zhaoning Yu and He Gao and Chou, {Stephen Y.}",

note = "Funding Information: This work is supported partially by DARPA and ONR. One of the authors (Q.X.) thanks Shufeng Bai for fruitful discussion and help in data processing and Haixiong Ge for suggestions on resist preparation.",

year = "2006",

doi = "10.1063/1.2335952",

language = "English (US)",

volume = "89",

journal = "Applied Physics Letters",

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T1 - In situ real time monitoring of nanosecond imprint process

AU - Xia, Qiangfei

AU - Yu, Zhaoning

AU - Gao, He

AU - Chou, Stephen Y.

N1 - Funding Information: This work is supported partially by DARPA and ONR. One of the authors (Q.X.) thanks Shufeng Bai for fruitful discussion and help in data processing and Haixiong Ge for suggestions on resist preparation.

PY - 2006

Y1 - 2006

N2 - Using a real time imprint monitoring system (RIMS), the authors measured the process time for laser assisted nanoimprint lithography to be about 200 ns. They found that during this short period of time, the mold had been fully pressed into the resist, resulting in a full pattern transfer with high fidelity. Their results also demonstrated the capability of RIMS for monitoring an ultrafast imprint process.

AB - Using a real time imprint monitoring system (RIMS), the authors measured the process time for laser assisted nanoimprint lithography to be about 200 ns. They found that during this short period of time, the mold had been fully pressed into the resist, resulting in a full pattern transfer with high fidelity. Their results also demonstrated the capability of RIMS for monitoring an ultrafast imprint process.

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U2 - 10.1063/1.2335952

DO - 10.1063/1.2335952

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VL - 89

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 7

M1 - 073107

ER -

In situ real time monitoring of nanosecond imprint process

Abstract

All Science Journal Classification (ASJC) codes

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