Impact of nanoimprint lithography to device development

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this paper, we review the status of nanoimprint lithography and its applications in nanodevices. In addition to sub-10 nm resolution, 3D patterning, and applications in other areas, we particularly discuss the fabrication of nanotransistors and circuits on 4 wafers using NIL at all lithography level and the fabrication of room temperature Si single electron transistors.

Original languageEnglish (US)
Title of host publication61st Device Research Conference, DRC 2003 - Conference Digest
PublisherInstitute of Electrical and Electronics Engineers Inc.
Number of pages1
ISBN (Electronic)0780377273
DOIs
StatePublished - Jan 1 2003
Event61st Device Research Conference, DRC 2003 - Salt Lake City, United States
Duration: Jun 23 2003Jun 25 2003

Publication series

NameDevice Research Conference - Conference Digest, DRC
Volume2003-January
ISSN (Print)1548-3770

Other

Other61st Device Research Conference, DRC 2003
CountryUnited States
CitySalt Lake City
Period6/23/036/25/03

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering

Keywords

  • Costs
  • Fabrication
  • Laboratories
  • Lithography
  • Manufacturing
  • Nanolithography
  • Optical materials
  • Research and development
  • Resists
  • Throughput

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  • Cite this

    Chou, S. Y. (2003). Impact of nanoimprint lithography to device development. In 61st Device Research Conference, DRC 2003 - Conference Digest [1226849] (Device Research Conference - Conference Digest, DRC; Vol. 2003-January). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/DRC.2003.1226849