@inproceedings{756a18e2d03945b790827ec33aa5c887,
title = "Impact of nanoimprint lithography to device development",
abstract = "In this paper, we review the status of nanoimprint lithography and its applications in nanodevices. In addition to sub-10 nm resolution, 3D patterning, and applications in other areas, we particularly discuss the fabrication of nanotransistors and circuits on 4 wafers using NIL at all lithography level and the fabrication of room temperature Si single electron transistors.",
keywords = "Costs, Fabrication, Laboratories, Lithography, Manufacturing, Nanolithography, Optical materials, Research and development, Resists, Throughput",
author = "Chou, {S. Y.}",
note = "Publisher Copyright: {\textcopyright} 2003 IEEE.; 61st Device Research Conference, DRC 2003 ; Conference date: 23-06-2003 Through 25-06-2003",
year = "2003",
doi = "10.1109/DRC.2003.1226849",
language = "English (US)",
series = "Device Research Conference - Conference Digest, DRC",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "11",
booktitle = "61st Device Research Conference, DRC 2003 - Conference Digest",
address = "United States",
}