Impact of nanoimprint lithography to device development

Research output: Chapter in Book/Report/Conference proceedingConference contribution


In this paper, we review the status of nanoimprint lithography and its applications in nanodevices. In addition to sub-10 nm resolution, 3D patterning, and applications in other areas, we particularly discuss the fabrication of nanotransistors and circuits on 4 wafers using NIL at all lithography level and the fabrication of room temperature Si single electron transistors.

Original languageEnglish (US)
Title of host publication61st Device Research Conference, DRC 2003 - Conference Digest
PublisherInstitute of Electrical and Electronics Engineers Inc.
Number of pages1
ISBN (Electronic)0780377273
StatePublished - 2003
Event61st Device Research Conference, DRC 2003 - Salt Lake City, United States
Duration: Jun 23 2003Jun 25 2003

Publication series

NameDevice Research Conference - Conference Digest, DRC
ISSN (Print)1548-3770


Other61st Device Research Conference, DRC 2003
Country/TerritoryUnited States
CitySalt Lake City

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering


  • Costs
  • Fabrication
  • Laboratories
  • Lithography
  • Manufacturing
  • Nanolithography
  • Optical materials
  • Research and development
  • Resists
  • Throughput


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