Hydrogen surface segregation on Si(111) by photon-stimulated desorption at the Si K edge

M. L. Knotek, G. M. Loubriel, R. H. Stulen, C. E. Parks, B. E. Koel, Z. Hussain

Research output: Contribution to journalArticle

24 Scopus citations

Abstract

The photon-stimulated desorption of H+ from cleaved Si(111) using photon energies near the Si K excitation threshold is reported. The time dependence of the H surface segregation from the bulk following cleavage shows two or three sequential time regimes of growth kinetics suggesting multiple sequential hydride phase formations. Removal of the H from the H-saturated surface results in the subsequent observation of only the first time regime (which we interpret as being due to formation of a monohydride phase).

Original languageEnglish (US)
Pages (from-to)2292-2295
Number of pages4
JournalPhysical Review B
Volume26
Issue number4
DOIs
StatePublished - Jan 1 1982
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics

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