Hydrogen passivation of germanium (100) surface using wet chemical preparation

Sandrine Rivillon, Yves J. Chabal, Fabrice Amy, Antoine Kahn

Research output: Contribution to journalArticle

125 Scopus citations

Abstract

A wet chemical preparation involving de-ionized water, hydrogen peroxide, and hydrofluoric acid is used to passivate germanium (Ge) (100) surfaces. Infrared absorption spectroscopy and x-ray photoemission spectroscopy studies show that oxide free and hydrogen-terminated Ge (100) surfaces can be obtained. As in the case for silicon (100) surfaces etched in hydrofluoric acid, hydrogen-terminated Ge (100) surfaces are atomically rough, with primarily mono- and dihydride terminations.

Original languageEnglish (US)
Article number253101
Pages (from-to)1-3
Number of pages3
JournalApplied Physics Letters
Volume87
Issue number25
DOIs
StatePublished - Dec 27 2005

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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