Abstract
A highly sensitive technique is reported to detect NO using X-ray photoelectron spectroscopy (XPS) of a silicon-bound iron hemelike complex. A self-assembled monolayer of an hydroxyalkylphosphonic acid was grown on the native oxide surface of silicon and was used for covalent attachment of hematin. XPS analysis for the hematin nitrogens gives a single peak in the N(1s) region. After reaction with NO, a new, distinct peak is observed in the N1s spectrum, at approximately 5.5 eV higher binding energy, which is attributed to the heme-bound NO. On the basis of measurements of surface loading of hematin species using quartz crystal microgravimmetry and XPS, detection of ≤50 picomoles of NO in the sampled region can be accomplished.
Original language | English (US) |
---|---|
Pages (from-to) | 6980-6981 |
Number of pages | 2 |
Journal | Journal of the American Chemical Society |
Volume | 129 |
Issue number | 22 |
DOIs | |
State | Published - Jun 6 2007 |
All Science Journal Classification (ASJC) codes
- General Chemistry
- Biochemistry
- Catalysis
- Colloid and Surface Chemistry