Highly sensitive nitric oxide detection using X-ray photoelectron spectroscopy

Manish Dubey, Steven L. Bernasek, Jeffrey Schwartz

Research output: Contribution to journalArticle

32 Scopus citations

Abstract

A highly sensitive technique is reported to detect NO using X-ray photoelectron spectroscopy (XPS) of a silicon-bound iron hemelike complex. A self-assembled monolayer of an hydroxyalkylphosphonic acid was grown on the native oxide surface of silicon and was used for covalent attachment of hematin. XPS analysis for the hematin nitrogens gives a single peak in the N(1s) region. After reaction with NO, a new, distinct peak is observed in the N1s spectrum, at approximately 5.5 eV higher binding energy, which is attributed to the heme-bound NO. On the basis of measurements of surface loading of hematin species using quartz crystal microgravimmetry and XPS, detection of ≤50 picomoles of NO in the sampled region can be accomplished.

Original languageEnglish (US)
Pages (from-to)6980-6981
Number of pages2
JournalJournal of the American Chemical Society
Volume129
Issue number22
DOIs
StatePublished - Jun 6 2007

All Science Journal Classification (ASJC) codes

  • Catalysis
  • Chemistry(all)
  • Biochemistry
  • Colloid and Surface Chemistry

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