High pressure uniform plasma formation

P. C. Efthimion, S. O. Macheret, R. B. Miles

Research output: Contribution to journalConference articlepeer-review

Abstract

An experiment was conducted to produce high pressure uniform plasmas using microwaves by enhancing the electromagnetic wave penetration with magnetic fields. At lower pressures this configuration is commonly used in semiconductor processing plasmas. Normally, the homogeneity and size of radio-frequency and microwave-driven plasmas are limited by insufficient penetration of the electromagnetic waves. Standard cold plasma wave theory including magnetic fields and electron-neutral and ion-neutral collisions has shed light on this issue.

Original languageEnglish (US)
Pages (from-to)241
Number of pages1
JournalIEEE International Conference on Plasma Science
StatePublished - 1998
EventProceedings of the 1998 IEEE International Conference on Plasma Science - Raleigh, NC, USA
Duration: Jun 1 1998Jun 4 1998

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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