Abstract
We demonstrate nanocrystalline silicon (nc-Si) top-gate thin-film transistors (TFTs) on optically clear, flexible plastic foil substrates. The silicon layers were deposited by plasma-enhanced chemical vapor deposition at a substrate temperature of 150°C. The n-channel nc-Si TFTs have saturation electron mobilities of 18 cm2V-1s-1 and transconductances of 0.22 μSμ-1. With a channel width to length ratio of 2, these TFTs deliver up to 0.1 mA to bottom emitting electrophosphorescent organic light-emitting devices (OLEDs) which were fabricated on a separate glass substrate. These results suggest that high-current, small-area OLED driver TFTs can be made by a low-temperature process, compatible with flexible clear plastic substrates.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 49-51 |
| Number of pages | 3 |
| Journal | IEEE Electron Device Letters |
| Volume | 27 |
| Issue number | 1 |
| DOIs | |
| State | Published - Jan 2006 |
All Science Journal Classification (ASJC) codes
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering
Keywords
- Clear plastic (CP) foil
- Electrophosphorescence
- Flexible substrate
- Nanocrystalline silicon (nc-Si)
- Organic light emitting device (OLED)
- Thin-film transistor (TFT)