High current plasma electron emitter

G. Fiksel; D. Craig; D. J.Den Hartog; D. Holly; R. Kendrick; T. W. Lovell; S. Oliva; S. C. Prager; J. S. Sarff; M. A. Thomas

High current plasma electron emitter

G. Fiksel, D. Craig, D. J.Den Hartog, D. Holly, R. Kendrick, T. W. Lovell, S. Oliva, S. C. Prager, J. S. Sarff, M. A. Thomas

Research output: Contribution to journal › Conference article › peer-review

Abstract

A high current plasma electron emitter based on a miniature plasma source has been developed. The source is characterized by a high electron emission current density and emission current, small size, and low impurity content. The emitting plasma is created by a pulsed high current gas discharge. The source is biased negatively to extract electrons. Electron currents of the order of 1 kA at a bias voltage of about 100 V are obtained. The source has a simple design and has proven to be very reliable in operation. Extensive studies of the effect of the source geometry and materials have been conducted.

Original language	English (US)
Pages (from-to)	219
Number of pages	1
Journal	IEEE International Conference on Plasma Science
State	Published - 1996
Event	Proceedings of the 1996 IEEE International Conference on Plasma Science - Boston, MA, USA Duration: Jun 3 1996 → Jun 5 1996

All Science Journal Classification (ASJC) codes

Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Electrical and Electronic Engineering

Cite this

@article{5dc39d23ef944fc7a0be20d2a4b89873,

title = "High current plasma electron emitter",

abstract = "A high current plasma electron emitter based on a miniature plasma source has been developed. The source is characterized by a high electron emission current density and emission current, small size, and low impurity content. The emitting plasma is created by a pulsed high current gas discharge. The source is biased negatively to extract electrons. Electron currents of the order of 1 kA at a bias voltage of about 100 V are obtained. The source has a simple design and has proven to be very reliable in operation. Extensive studies of the effect of the source geometry and materials have been conducted.",

author = "G. Fiksel and D. Craig and Hartog, {D. J.Den} and D. Holly and R. Kendrick and Lovell, {T. W.} and S. Oliva and Prager, {S. C.} and Sarff, {J. S.} and Thomas, {M. A.}",

year = "1996",

language = "English (US)",

pages = "219",

journal = "IEEE International Conference on Plasma Science",

issn = "0730-9244",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

note = "Proceedings of the 1996 IEEE International Conference on Plasma Science ; Conference date: 03-06-1996 Through 05-06-1996",

}

TY - JOUR

T1 - High current plasma electron emitter

AU - Fiksel, G.

AU - Craig, D.

AU - Hartog, D. J.Den

AU - Holly, D.

AU - Kendrick, R.

AU - Lovell, T. W.

AU - Oliva, S.

AU - Prager, S. C.

AU - Sarff, J. S.

AU - Thomas, M. A.

PY - 1996

Y1 - 1996

N2 - A high current plasma electron emitter based on a miniature plasma source has been developed. The source is characterized by a high electron emission current density and emission current, small size, and low impurity content. The emitting plasma is created by a pulsed high current gas discharge. The source is biased negatively to extract electrons. Electron currents of the order of 1 kA at a bias voltage of about 100 V are obtained. The source has a simple design and has proven to be very reliable in operation. Extensive studies of the effect of the source geometry and materials have been conducted.

AB - A high current plasma electron emitter based on a miniature plasma source has been developed. The source is characterized by a high electron emission current density and emission current, small size, and low impurity content. The emitting plasma is created by a pulsed high current gas discharge. The source is biased negatively to extract electrons. Electron currents of the order of 1 kA at a bias voltage of about 100 V are obtained. The source has a simple design and has proven to be very reliable in operation. Extensive studies of the effect of the source geometry and materials have been conducted.

UR - http://www.scopus.com/inward/record.url?scp=0029714606&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0029714606&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0029714606

SN - 0730-9244

SP - 219

JO - IEEE International Conference on Plasma Science

JF - IEEE International Conference on Plasma Science

T2 - Proceedings of the 1996 IEEE International Conference on Plasma Science

Y2 - 3 June 1996 through 5 June 1996

ER -

High current plasma electron emitter

Abstract

All Science Journal Classification (ASJC) codes

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