HETEROATOM REMOVAL ON TUNGSTEN SURFACES.

Jay Burton Benziger, Richard E. Preston

Research output: Contribution to journalArticle

Abstract

The reactions of model organosulfur compounds on well defined tungsten surfaces were studied by LEED, AES, temperature programmed reactions and infrared spectroscopy. Methanethiol adsorbed by an oxidative adsorption mechanism via electrophilic attack at the surface. Adsorbed oxygen inhibited the adsorption of methanethiol, while adsorbed sulfur reduced the oxidation strength of the surface but methanethiol still adsorbed by the formation of a disulfide. Tetrahydrothiophene reacted in similar fashion to methanethiol. Thiophene required a stronger oxidizing surface to adsorb than methanethiol or tetrahydrothiophene. Adsorption was initially flat and subsequently electrophilic attack at the 2 position produced an edge bonded intermediate. The desulfurization of thiophene appeared to occur by C-S bond scission to an adsorbed hydrocarbon and adsorbed sulfur. These results are shown to be analogous to electrophilic reactions of organosulfur compounds.

Original languageEnglish (US)
JournalAnnual Meeting - American Institute of Chemical Engineers
StatePublished - Dec 1 1984

All Science Journal Classification (ASJC) codes

  • Engineering(all)

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