Green Lithography for Delicate Materials

Artem Grebenko, Anton Bubis, Konstantin Motovilov, Viacheslav Dremov, Evgeny Korostylev, Ivan Kindiak, Fedor S. Fedorov, Sergey Luchkin, Yuliya Zhuikova, Aleksandr Trofimenko, Gleb Filkov, Georgiy Sviridov, Andrey Ivanov, Jordan T. Dull, Rais Mozhchil, Andrey Ionov, Valery Varlamov, Barry P. Rand, Vitaly Podzorov, Albert G. Nasibulin

Research output: Contribution to journalArticlepeer-review

9 Scopus citations


A variety of unconventional materials, including biological nanostructures, organic and hybrid semiconductors, as well as monolayer, and other low-dimensional systems, are actively explored. They are usually incompatible with standard lithographic techniques that use harsh organic solvents and other detrimental processing. Here, a new class of green and gentle lithographic resists, compatible with delicate materials and capable of both top-down and bottom-up fabrication routines is developed. To demonstrate the excellence of this approach, devices with sub-micron features are fabricated on organic semiconductor crystals and individual animal's brain microtubules. Such structures are created for the first time, thanks to the genuinely water-based lithography, which opens an avenue for the thorough research of unconventional delicate materials at the nanoscale.

Original languageEnglish (US)
Article number2101533
JournalAdvanced Functional Materials
Issue number27
StatePublished - Jul 2 2021

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • General Chemistry
  • Condensed Matter Physics
  • General Materials Science
  • Electrochemistry
  • Biomaterials


  • bio-nanostructures
  • delicate materials
  • lithography
  • organic semiconductors


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