Green Lithography for Delicate Materials

Artem Grebenko; Anton Bubis; Konstantin Motovilov; Viacheslav Dremov; Evgeny Korostylev; Ivan Kindiak; Fedor S. Fedorov; Sergey Luchkin; Yuliya Zhuikova; Aleksandr Trofimenko; Gleb Filkov; Georgiy Sviridov; Andrey Ivanov; Jordan T. Dull; Rais Mozhchil; Andrey Ionov; Valery Varlamov; Barry P. Rand; Vitaly Podzorov; Albert G. Nasibulin

doi:10.1002/adfm.202101533

Green Lithography for Delicate Materials

Artem Grebenko, Anton Bubis, Konstantin Motovilov, Viacheslav Dremov, Evgeny Korostylev, Ivan Kindiak, Fedor S. Fedorov, Sergey Luchkin, Yuliya Zhuikova, Aleksandr Trofimenko, Gleb Filkov, Georgiy Sviridov, Andrey Ivanov, Jordan T. Dull, Rais Mozhchil, Andrey Ionov, Valery Varlamov, Barry P. Rand, Vitaly Podzorov, Albert G. Nasibulin

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Abstract

A variety of unconventional materials, including biological nanostructures, organic and hybrid semiconductors, as well as monolayer, and other low-dimensional systems, are actively explored. They are usually incompatible with standard lithographic techniques that use harsh organic solvents and other detrimental processing. Here, a new class of green and gentle lithographic resists, compatible with delicate materials and capable of both top-down and bottom-up fabrication routines is developed. To demonstrate the excellence of this approach, devices with sub-micron features are fabricated on organic semiconductor crystals and individual animal's brain microtubules. Such structures are created for the first time, thanks to the genuinely water-based lithography, which opens an avenue for the thorough research of unconventional delicate materials at the nanoscale.

Original language	English (US)
Article number	2101533
Journal	Advanced Functional Materials
Volume	31
Issue number	27
DOIs	https://doi.org/10.1002/adfm.202101533
State	Published - Jul 2 2021

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
General Chemistry
Condensed Matter Physics
General Materials Science
Electrochemistry
Biomaterials

Keywords

bio-nanostructures
delicate materials
lithography
organic semiconductors

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10.1002/adfm.202101533

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Grebenko, A., Bubis, A., Motovilov, K., Dremov, V., Korostylev, E., Kindiak, I., Fedorov, F. S., Luchkin, S., Zhuikova, Y., Trofimenko, A., Filkov, G., Sviridov, G., Ivanov, A., Dull, J. T., Mozhchil, R., Ionov, A., Varlamov, V., Rand, B. P., Podzorov, V., & Nasibulin, A. G. (2021). Green Lithography for Delicate Materials. Advanced Functional Materials, 31(27), Article 2101533. https://doi.org/10.1002/adfm.202101533

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abstract = "A variety of unconventional materials, including biological nanostructures, organic and hybrid semiconductors, as well as monolayer, and other low-dimensional systems, are actively explored. They are usually incompatible with standard lithographic techniques that use harsh organic solvents and other detrimental processing. Here, a new class of green and gentle lithographic resists, compatible with delicate materials and capable of both top-down and bottom-up fabrication routines is developed. To demonstrate the excellence of this approach, devices with sub-micron features are fabricated on organic semiconductor crystals and individual animal's brain microtubules. Such structures are created for the first time, thanks to the genuinely water-based lithography, which opens an avenue for the thorough research of unconventional delicate materials at the nanoscale.",

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author = "Artem Grebenko and Anton Bubis and Konstantin Motovilov and Viacheslav Dremov and Evgeny Korostylev and Ivan Kindiak and Fedorov, {Fedor S.} and Sergey Luchkin and Yuliya Zhuikova and Aleksandr Trofimenko and Gleb Filkov and Georgiy Sviridov and Andrey Ivanov and Dull, {Jordan T.} and Rais Mozhchil and Andrey Ionov and Valery Varlamov and Rand, {Barry P.} and Vitaly Podzorov and Nasibulin, {Albert G.}",

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Grebenko, A, Bubis, A, Motovilov, K, Dremov, V, Korostylev, E, Kindiak, I, Fedorov, FS, Luchkin, S, Zhuikova, Y, Trofimenko, A, Filkov, G, Sviridov, G, Ivanov, A, Dull, JT, Mozhchil, R, Ionov, A, Varlamov, V, Rand, BP, Podzorov, V & Nasibulin, AG 2021, 'Green Lithography for Delicate Materials', Advanced Functional Materials, vol. 31, no. 27, 2101533. https://doi.org/10.1002/adfm.202101533

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AU - Grebenko, Artem

AU - Bubis, Anton

AU - Motovilov, Konstantin

AU - Dremov, Viacheslav

AU - Korostylev, Evgeny

AU - Kindiak, Ivan

AU - Fedorov, Fedor S.

AU - Luchkin, Sergey

AU - Zhuikova, Yuliya

AU - Trofimenko, Aleksandr

AU - Filkov, Gleb

AU - Sviridov, Georgiy

AU - Ivanov, Andrey

AU - Dull, Jordan T.

AU - Mozhchil, Rais

AU - Ionov, Andrey

AU - Varlamov, Valery

AU - Rand, Barry P.

AU - Podzorov, Vitaly

AU - Nasibulin, Albert G.

PY - 2021/7/2

Y1 - 2021/7/2

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AB - A variety of unconventional materials, including biological nanostructures, organic and hybrid semiconductors, as well as monolayer, and other low-dimensional systems, are actively explored. They are usually incompatible with standard lithographic techniques that use harsh organic solvents and other detrimental processing. Here, a new class of green and gentle lithographic resists, compatible with delicate materials and capable of both top-down and bottom-up fabrication routines is developed. To demonstrate the excellence of this approach, devices with sub-micron features are fabricated on organic semiconductor crystals and individual animal's brain microtubules. Such structures are created for the first time, thanks to the genuinely water-based lithography, which opens an avenue for the thorough research of unconventional delicate materials at the nanoscale.

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KW - delicate materials

KW - lithography

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Green Lithography for Delicate Materials

Abstract

All Science Journal Classification (ASJC) codes

Keywords

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