Generating sub-micron features on rough surfaces using optical trap assisted nanopatterning

Yu Cheng Tsai, Romain Fardel, Craig B. Arnold

Research output: Chapter in Book/Report/Conference proceedingConference contribution

8 Scopus citations


Near-field intensity enhancement enables laser modification of materials with feature sizes below the classical diffraction limit. However, the need to maintain close distances between the objective element and the substrate typically limit demonstrations of this technology to flat surfaces, even though there are many cases where the ability to produce sub-micron features on rough or structured surfaces are needed. Here, we show the use of a new technique, optical trap assisted nanopatterning (OTAN), for the production of nanoscale features on rippled substrates. The ability to position a microbead near-field objective close to the surface without the need for active feedback and control allows one to continuously move the bead across a rough surface without sticking. Sub-micron patterning of polyimide is demonstrated on surfaces with 1.1 μm steps showing good uniformity. Finally, the enabling technology allows for straightforward parallelization where multiple patterns can be created simultaneously over surface.

Original languageEnglish (US)
Title of host publicationInternational Symposium on High Power Laser Ablation 2010, HPLA 2010
Number of pages8
StatePublished - 2010
EventInternational High Power Laser Ablation Symposium, HPLA 2010 - Santa Fe, NM, United States
Duration: Apr 18 2010Apr 22 2010

Publication series

NameAIP Conference Proceedings
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616


OtherInternational High Power Laser Ablation Symposium, HPLA 2010
Country/TerritoryUnited States
CitySanta Fe, NM

All Science Journal Classification (ASJC) codes

  • General Physics and Astronomy


  • Bessel beams
  • Laser processing
  • Nanolithography
  • Near-field
  • Optical trap assisted nanopatterning


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