Abstract
The need to generate sub 100 nm features is of interest for a variety of applications including optics, optoelectronics, and plasmonics. To address this requirement, several advanced optical lithography techniques have been developed based on either multiphoton absorption polymerization or near-field effects. In this paper, we combine strengths from multiphoton absorption and near field using optical trap assisted nanopatterning (OTAN). A Gaussian beam is used to position a microsphere in a polymer precursor fluid near a substrate. An ultrafast laser is focused by that microsphere to induce multiphoton polymerization in the near field, leading additive direct-write nanoscale processing.
Original language | English (US) |
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Pages (from-to) | 669-673 |
Number of pages | 5 |
Journal | Physics Procedia |
Volume | 39 |
DOIs | |
State | Published - 2012 |
Event | 7th International Conference on Laser Assisted Net Shape Engineering. LANE 2012 - Furth, Germany Duration: Nov 12 2012 → Nov 15 2012 |
All Science Journal Classification (ASJC) codes
- General Physics and Astronomy
Keywords
- Multiphoton absoprtion
- Near-field
- Optical trapping
- Polymerization