Fully elastic interconnects on nanopatterned elastomeric substrates

Prashant Mandlik; Stéphanie P. Lacour; Jason W. Li; Stephen Y. Chou; Sigurd Wagner

doi:10.1109/LED.2006.879029

Fully elastic interconnects on nanopatterned elastomeric substrates

Prashant Mandlik, Stéphanie P. Lacour, Jason W. Li, Stephen Y. Chou, Sigurd Wagner

Research output: Contribution to journal › Article › peer-review

45 Scopus citations

Abstract

Elastically stretchable metal interconnects are required for electronic skin. To date, the resistance of such thin-film interconnects has been found to increase much more with mechanical strain than expected from purely geometrical deformation of the conductor. It has been discovered that the resistance change due to fully elastic deformation is minimal when the metal films are deposited on pyramidal nanopatterned surfaces. The nanopattern constrains the film to purely elastic deformation by localizing the microcracks that are formed in the conductor during stretching. Between 0% and 25% mechanical strain, the electrical resistance increases by only 60%, which is in close agreement with purely geometric deformation.

Original language	English (US)
Pages (from-to)	650-652
Number of pages	3
Journal	IEEE Electron Device Letters
Volume	27
Issue number	8
DOIs	https://doi.org/10.1109/LED.2006.879029
State	Published - Aug 2006

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Electrical and Electronic Engineering

Keywords

Flexible structures
Nanotechnology
Silicone rubber
Thin-film circuit interconnections

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10.1109/LED.2006.879029

Cite this

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title = "Fully elastic interconnects on nanopatterned elastomeric substrates",

abstract = "Elastically stretchable metal interconnects are required for electronic skin. To date, the resistance of such thin-film interconnects has been found to increase much more with mechanical strain than expected from purely geometrical deformation of the conductor. It has been discovered that the resistance change due to fully elastic deformation is minimal when the metal films are deposited on pyramidal nanopatterned surfaces. The nanopattern constrains the film to purely elastic deformation by localizing the microcracks that are formed in the conductor during stretching. Between 0% and 25% mechanical strain, the electrical resistance increases by only 60%, which is in close agreement with purely geometric deformation.",

keywords = "Flexible structures, Nanotechnology, Silicone rubber, Thin-film circuit interconnections",

author = "Prashant Mandlik and Lacour, {St{\'e}phanie P.} and Li, {Jason W.} and Chou, {Stephen Y.} and Sigurd Wagner",

note = "Funding Information: Manuscript received April 27, 2006; revised June 1, 2006. This work was supported in part by the Defense Advanced Research Projects Agency (DARPA), Office of Naval Research (ONR), and in part by the New Jersey Commission for Science and Technology. The review of this letter was arranged by Editor S. Kawamura.",

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doi = "10.1109/LED.2006.879029",

language = "English (US)",

volume = "27",

pages = "650--652",

journal = "IEEE Electron Device Letters",

issn = "0741-3106",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

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T1 - Fully elastic interconnects on nanopatterned elastomeric substrates

AU - Mandlik, Prashant

AU - Lacour, Stéphanie P.

AU - Li, Jason W.

AU - Chou, Stephen Y.

AU - Wagner, Sigurd

N1 - Funding Information: Manuscript received April 27, 2006; revised June 1, 2006. This work was supported in part by the Defense Advanced Research Projects Agency (DARPA), Office of Naval Research (ONR), and in part by the New Jersey Commission for Science and Technology. The review of this letter was arranged by Editor S. Kawamura.

PY - 2006/8

Y1 - 2006/8

N2 - Elastically stretchable metal interconnects are required for electronic skin. To date, the resistance of such thin-film interconnects has been found to increase much more with mechanical strain than expected from purely geometrical deformation of the conductor. It has been discovered that the resistance change due to fully elastic deformation is minimal when the metal films are deposited on pyramidal nanopatterned surfaces. The nanopattern constrains the film to purely elastic deformation by localizing the microcracks that are formed in the conductor during stretching. Between 0% and 25% mechanical strain, the electrical resistance increases by only 60%, which is in close agreement with purely geometric deformation.

AB - Elastically stretchable metal interconnects are required for electronic skin. To date, the resistance of such thin-film interconnects has been found to increase much more with mechanical strain than expected from purely geometrical deformation of the conductor. It has been discovered that the resistance change due to fully elastic deformation is minimal when the metal films are deposited on pyramidal nanopatterned surfaces. The nanopattern constrains the film to purely elastic deformation by localizing the microcracks that are formed in the conductor during stretching. Between 0% and 25% mechanical strain, the electrical resistance increases by only 60%, which is in close agreement with purely geometric deformation.

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KW - Nanotechnology

KW - Silicone rubber

KW - Thin-film circuit interconnections

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Fully elastic interconnects on nanopatterned elastomeric substrates

Abstract

All Science Journal Classification (ASJC) codes

Keywords

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