Fully elastic interconnects on nanopatterned elastomeric substrates

Prashant Mandlik, Stéphanie P. Lacour, Jason W. Li, Stephen Y. Chou, Sigurd Wagner

Research output: Contribution to journalArticle

41 Scopus citations

Abstract

Elastically stretchable metal interconnects are required for electronic skin. To date, the resistance of such thin-film interconnects has been found to increase much more with mechanical strain than expected from purely geometrical deformation of the conductor. It has been discovered that the resistance change due to fully elastic deformation is minimal when the metal films are deposited on pyramidal nanopatterned surfaces. The nanopattern constrains the film to purely elastic deformation by localizing the microcracks that are formed in the conductor during stretching. Between 0% and 25% mechanical strain, the electrical resistance increases by only 60%, which is in close agreement with purely geometric deformation.

Original languageEnglish (US)
Pages (from-to)650-652
Number of pages3
JournalIEEE Electron Device Letters
Volume27
Issue number8
DOIs
StatePublished - Aug 1 2006

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

Keywords

  • Flexible structures
  • Nanotechnology
  • Silicone rubber
  • Thin-film circuit interconnections

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