F2 reaction dynamics with defective Si(100): defect-insensitive surface chemistry

Lawrence E. Carter, Emily A. Carter

Research output: Contribution to journalArticlepeer-review

23 Scopus citations

Abstract

We have investigated the influence of a variety of dimer vacancy defects on the reactivity of F2 molecules with the clean Si(100)-2 × 1 reconstructed surface via molecular dynamics using an ab-initio-derived Stillinger-Weber-type many-body potential. Our simulations of a wide variety of defective surfaces indicate that vacancy defects have a negligible effect on the reactivity of F2 molecules toward the Si surface. These simulations suggest that the density of accessible Si dangling bonds (i.e., the number of reactive surface sites) is the sole critical factor in determining the reactivity for this highly exothermic surface reaction. Thus, defective Si(100) exhibits essentially the same reactivity toward F2 as a perfect Si(100)-2 × 1 surface.

Original languageEnglish (US)
Pages (from-to)39-50
Number of pages12
JournalSurface Science
Volume323
Issue number1-2
DOIs
StatePublished - Jan 10 1995
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Keywords

  • Adsorption kinetics
  • Etching
  • Halogens
  • Models of surface chemical reactions
  • Molecular dynamics
  • Silicon
  • Surface defects

Fingerprint Dive into the research topics of 'F<sub>2</sub> reaction dynamics with defective Si(100): defect-insensitive surface chemistry'. Together they form a unique fingerprint.

Cite this