Fluorine atom subsurface diffusion and reaction in photoresist

Frank Greer; D. Fraser; J. W. Coburn; David B. Graves

doi:10.1063/1.1625782

Fluorine atom subsurface diffusion and reaction in photoresist

Frank Greer, D. Fraser, J. W. Coburn, David B. Graves

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

Kinetics of fluorine atom-photoresist (PR) interactions were discussed. The films of PR were coated on quartz-crystal microbalance (QCM) substrates. A molecular-beam quadrupole mass spectrometer (QMS) was used to measure the species desorbing from the surface during F atom exposure. The results show hydrogen abstraction and etching of the PR during the D atom exposure but there is no DF formation.

Original language	English (US)
Pages (from-to)	7453-7461
Number of pages	9
Journal	Journal of Applied Physics
Volume	94
Issue number	12
DOIs	https://doi.org/10.1063/1.1625782
State	Published - Dec 15 2003
Externally published	Yes

All Science Journal Classification (ASJC) codes

General Physics and Astronomy

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10.1063/1.1625782

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title = "Fluorine atom subsurface diffusion and reaction in photoresist",

abstract = "Kinetics of fluorine atom-photoresist (PR) interactions were discussed. The films of PR were coated on quartz-crystal microbalance (QCM) substrates. A molecular-beam quadrupole mass spectrometer (QMS) was used to measure the species desorbing from the surface during F atom exposure. The results show hydrogen abstraction and etching of the PR during the D atom exposure but there is no DF formation.",

author = "Frank Greer and D. Fraser and Coburn, \{J. W.\} and Graves, \{David B.\}",

year = "2003",

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day = "15",

doi = "10.1063/1.1625782",

language = "English (US)",

volume = "94",

pages = "7453--7461",

journal = "Journal of Applied Physics",

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publisher = "American Institute of Physics",

number = "12",

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T1 - Fluorine atom subsurface diffusion and reaction in photoresist

AU - Greer, Frank

AU - Fraser, D.

AU - Coburn, J. W.

AU - Graves, David B.

PY - 2003/12/15

Y1 - 2003/12/15

N2 - Kinetics of fluorine atom-photoresist (PR) interactions were discussed. The films of PR were coated on quartz-crystal microbalance (QCM) substrates. A molecular-beam quadrupole mass spectrometer (QMS) was used to measure the species desorbing from the surface during F atom exposure. The results show hydrogen abstraction and etching of the PR during the D atom exposure but there is no DF formation.

AB - Kinetics of fluorine atom-photoresist (PR) interactions were discussed. The films of PR were coated on quartz-crystal microbalance (QCM) substrates. A molecular-beam quadrupole mass spectrometer (QMS) was used to measure the species desorbing from the surface during F atom exposure. The results show hydrogen abstraction and etching of the PR during the D atom exposure but there is no DF formation.

UR - https://www.scopus.com/pages/publications/0346305193

UR - https://www.scopus.com/inward/citedby.url?scp=0346305193&partnerID=8YFLogxK

U2 - 10.1063/1.1625782

DO - 10.1063/1.1625782

M3 - Article

AN - SCOPUS:0346305193

SN - 0021-8979

VL - 94

SP - 7453

EP - 7461

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 12

ER -

Fluorine atom subsurface diffusion and reaction in photoresist

Abstract

All Science Journal Classification (ASJC) codes

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