Fluorine atom subsurface diffusion and reaction in photoresist

Frank Greer, D. Fraser, J. W. Coburn, David B. Graves

Research output: Contribution to journalArticlepeer-review

7 Scopus citations


Kinetics of fluorine atom-photoresist (PR) interactions were discussed. The films of PR were coated on quartz-crystal microbalance (QCM) substrates. A molecular-beam quadrupole mass spectrometer (QMS) was used to measure the species desorbing from the surface during F atom exposure. The results show hydrogen abstraction and etching of the PR during the D atom exposure but there is no DF formation.

Original languageEnglish (US)
Pages (from-to)7453-7461
Number of pages9
JournalJournal of Applied Physics
Issue number12
StatePublished - Dec 15 2003
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • General Physics and Astronomy


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