Abstract
Kinetics of fluorine atom-photoresist (PR) interactions were discussed. The films of PR were coated on quartz-crystal microbalance (QCM) substrates. A molecular-beam quadrupole mass spectrometer (QMS) was used to measure the species desorbing from the surface during F atom exposure. The results show hydrogen abstraction and etching of the PR during the D atom exposure but there is no DF formation.
Original language | English (US) |
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Pages (from-to) | 7453-7461 |
Number of pages | 9 |
Journal | Journal of Applied Physics |
Volume | 94 |
Issue number | 12 |
DOIs | |
State | Published - Dec 15 2003 |
Externally published | Yes |
All Science Journal Classification (ASJC) codes
- General Physics and Astronomy