Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

Zhaoning Yu; Lei Chen; Wei Wu; Haixiong Ge; Stephen Y. Chou

doi:10.1116/1.1609471

Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

Zhaoning Yu, Lei Chen, Wei Wu, Haixiong Ge, Stephen Y. Chou

Research output: Contribution to journal › Article › peer-review

Original language	English (US)
Pages (from-to)	2089-2092
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	21
Issue number	5
DOIs	https://doi.org/10.1116/1.1609471
State	Published - 2003

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.1609471

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title = "Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography",

author = "Zhaoning Yu and Lei Chen and Wei Wu and Haixiong Ge and Chou, {Stephen Y.}",

year = "2003",

doi = "10.1116/1.1609471",

language = "English (US)",

volume = "21",

pages = "2089--2092",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

number = "5",

}

TY - JOUR

T1 - Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

AU - Yu, Zhaoning

AU - Chen, Lei

AU - Wu, Wei

AU - Ge, Haixiong

AU - Chou, Stephen Y.

PY - 2003

Y1 - 2003

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U2 - 10.1116/1.1609471

DO - 10.1116/1.1609471

M3 - Article

AN - SCOPUS:0242425714

SN - 1071-1023

VL - 21

SP - 2089

EP - 2092

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

IS - 5

ER -

Fabrication of nanoscale gratings with reduced line edge roughness using nanoimprint lithography

All Science Journal Classification (ASJC) codes

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