@article{f3cb1a3ac1704b9dab6fd728eeecb97b,
title = "Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff",
author = "Zhaoning Yu and He Gao and Wei Wu and Haixiong Ge and Chou, {Stephen Y.}",
year = "2003",
doi = "10.1116/1.1619958",
language = "English (US)",
volume = "21",
pages = "2874--2877",
journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",
issn = "1071-1023",
publisher = "American Institute of Physics",
number = "6",
}