Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff

Zhaoning Yu, He Gao, Wei Wu, Haixiong Ge, Stephen Y. Chou

Research output: Contribution to journalArticle

218 Scopus citations
Original languageEnglish (US)
Pages (from-to)2874-2877
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number6
DOIs
StatePublished - 2003

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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