Several 100 nm pitch gratings were fabricated over a large area using a simple, low-cost, fast process that includes fabrication of a 100 nm pitch grating mold by doubling the number of lines of a 200 nm period grating and pattern replication using nanoimprint lithography (NIL). Form birefringence of the 100 nm pitch grating was studied using ellipsometry. The experimental data showed good agreement with effective medium theory.
|Original language||English (US)|
|Number of pages||4|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|State||Published - Nov 1 2001|
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Electrical and Electronic Engineering