Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications

Zhaoning Yu, Wei Wu, Lei Chen, Stephen Y. Chou

Research output: Contribution to journalArticle

61 Scopus citations

Abstract

Several 100 nm pitch gratings were fabricated over a large area using a simple, low-cost, fast process that includes fabrication of a 100 nm pitch grating mold by doubling the number of lines of a 200 nm period grating and pattern replication using nanoimprint lithography (NIL). Form birefringence of the 100 nm pitch grating was studied using ellipsometry. The experimental data showed good agreement with effective medium theory.

Original languageEnglish (US)
Pages (from-to)2816-2819
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume19
Issue number6
DOIs
StatePublished - Nov 1 2001

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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