Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications

Zhaoning Yu; Wei Wu; Lei Chen; Stephen Y. Chou

doi:10.1116/1.1409384

Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications

Zhaoning Yu, Wei Wu, Lei Chen, Stephen Y. Chou

Research output: Contribution to journal › Article › peer-review

65 Scopus citations

Abstract

Several 100 nm pitch gratings were fabricated over a large area using a simple, low-cost, fast process that includes fabrication of a 100 nm pitch grating mold by doubling the number of lines of a 200 nm period grating and pattern replication using nanoimprint lithography (NIL). Form birefringence of the 100 nm pitch grating was studied using ellipsometry. The experimental data showed good agreement with effective medium theory.

Original language	English (US)
Pages (from-to)	2816-2819
Number of pages	4
Journal	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume	19
Issue number	6
DOIs	https://doi.org/10.1116/1.1409384
State	Published - Nov 2001

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Electrical and Electronic Engineering

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10.1116/1.1409384

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title = "Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications",

abstract = "Several 100 nm pitch gratings were fabricated over a large area using a simple, low-cost, fast process that includes fabrication of a 100 nm pitch grating mold by doubling the number of lines of a 200 nm period grating and pattern replication using nanoimprint lithography (NIL). Form birefringence of the 100 nm pitch grating was studied using ellipsometry. The experimental data showed good agreement with effective medium theory.",

author = "Zhaoning Yu and Wei Wu and Lei Chen and Chou, {Stephen Y.}",

year = "2001",

month = nov,

doi = "10.1116/1.1409384",

language = "English (US)",

volume = "19",

pages = "2816--2819",

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issn = "1071-1023",

publisher = "American Institute of Physics",

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Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications. / Yu, Zhaoning; Wu, Wei; Chen, Lei et al.
In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 19, No. 6, 11.2001, p. 2816-2819.

Research output: Contribution to journal › Article › peer-review

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T1 - Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications

AU - Yu, Zhaoning

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AU - Chen, Lei

AU - Chou, Stephen Y.

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AB - Several 100 nm pitch gratings were fabricated over a large area using a simple, low-cost, fast process that includes fabrication of a 100 nm pitch grating mold by doubling the number of lines of a 200 nm period grating and pattern replication using nanoimprint lithography (NIL). Form birefringence of the 100 nm pitch grating was studied using ellipsometry. The experimental data showed good agreement with effective medium theory.

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Fabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications

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