Abstract
A robust technique for fabrication of metal wires with controlled widths substantially below 10 nm is presented. By etching a cleaved molecular-beam epitaxy grown substrate, a mechanical template is produced with surface relief of atomic lateral definition. Using metal deposition and directional ion etching of such a substrate, electrically continuous wires are formed from AuPd alloy with diameters as small as 3 nm and lengths greater than 1 μm. This technique can be used with a variety of materials and makes metallic nanostructures on a previously inaccessible size scale.
Original language | English (US) |
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Pages (from-to) | 1991-1993 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 77 |
Issue number | 13 |
DOIs | |
State | Published - Sep 25 2000 |
Externally published | Yes |
All Science Journal Classification (ASJC) codes
- Physics and Astronomy (miscellaneous)