Fabrication of extremely narrow metal wires

D. Natelson, R. L. Willett, K. W. West, L. N. Pfeiffer

Research output: Contribution to journalArticlepeer-review

56 Scopus citations


A robust technique for fabrication of metal wires with controlled widths substantially below 10 nm is presented. By etching a cleaved molecular-beam epitaxy grown substrate, a mechanical template is produced with surface relief of atomic lateral definition. Using metal deposition and directional ion etching of such a substrate, electrically continuous wires are formed from AuPd alloy with diameters as small as 3 nm and lengths greater than 1 μm. This technique can be used with a variety of materials and makes metallic nanostructures on a previously inaccessible size scale.

Original languageEnglish (US)
Pages (from-to)1991-1993
Number of pages3
JournalApplied Physics Letters
Issue number13
StatePublished - Sep 25 2000
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)


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