Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography

Mingtao Li, Jian Wang, Lei Zhuang, Stephen Y. Chou

Research output: Contribution to journalArticle

126 Scopus citations

Abstract

We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm minimum linewidth in polymethyl methacrylate using nanoimprint lithography, and in metals by means of a lift-off technique. Observation of sharp Moiré patterns indicated the high fidelity of nanoimprint lithography in pattern duplication. Our results showed that nanoimprint lithography is a promising technology for patterning integrated optics.

Original languageEnglish (US)
Pages (from-to)673-675
Number of pages3
JournalApplied Physics Letters
Volume76
Issue number6
DOIs
StatePublished - Feb 7 2000

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)

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