Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography

Mingtao Li; Jian Wang; Lei Zhuang; Stephen Y. Chou

doi:10.1063/1.125896

Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography

Mingtao Li, Jian Wang, Lei Zhuang, Stephen Y. Chou

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136 Scopus citations

Abstract

We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm minimum linewidth in polymethyl methacrylate using nanoimprint lithography, and in metals by means of a lift-off technique. Observation of sharp Moiré patterns indicated the high fidelity of nanoimprint lithography in pattern duplication. Our results showed that nanoimprint lithography is a promising technology for patterning integrated optics.

Original language	English (US)
Pages (from-to)	673-675
Number of pages	3
Journal	Applied Physics Letters
Volume	76
Issue number	6
DOIs	https://doi.org/10.1063/1.125896
State	Published - Feb 7 2000

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.125896

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title = "Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography",

abstract = "We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm minimum linewidth in polymethyl methacrylate using nanoimprint lithography, and in metals by means of a lift-off technique. Observation of sharp Moir{\'e} patterns indicated the high fidelity of nanoimprint lithography in pattern duplication. Our results showed that nanoimprint lithography is a promising technology for patterning integrated optics.",

author = "Mingtao Li and Jian Wang and Lei Zhuang and Chou, {Stephen Y.}",

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AU - Li, Mingtao

AU - Wang, Jian

AU - Zhuang, Lei

AU - Chou, Stephen Y.

PY - 2000/2/7

Y1 - 2000/2/7

N2 - We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm minimum linewidth in polymethyl methacrylate using nanoimprint lithography, and in metals by means of a lift-off technique. Observation of sharp Moiré patterns indicated the high fidelity of nanoimprint lithography in pattern duplication. Our results showed that nanoimprint lithography is a promising technology for patterning integrated optics.

AB - We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm minimum linewidth in polymethyl methacrylate using nanoimprint lithography, and in metals by means of a lift-off technique. Observation of sharp Moiré patterns indicated the high fidelity of nanoimprint lithography in pattern duplication. Our results showed that nanoimprint lithography is a promising technology for patterning integrated optics.

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Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography

Abstract

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