Fabrication of a new broadband waveguide polarizer with a double-layer 190 nm period metal-gratings using nanoimprint lithography

Jian Wang, Steven Schablitsky, Zhaoning Yu, Wei Wu, Stephen Y. Chou

Research output: Contribution to journalArticle

79 Scopus citations

Abstract

We fabricated a new waveguide polarizer, that has a double-layer 190 nm period metal grating at the interface between the waveguide core and waveguide cladding layer. Both silicon nitride and polymethylmethancrylate were used as waveguide cores. 190 nm period gratings were patterned by nanoimprint lithography. The new type waveguide polarizer works as a broadband and highly efficient transverse magnetic-pass polarizer with transverse electric-polarized light highly attenuated. The new polarizer structure can be applied to almost any waveguide structures. The simple fabrication process, which is compatible with conventional device processing, makes it very attractive for integrated optoelectronic system.

Original languageEnglish (US)
Pages (from-to)2957-2960
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume17
Issue number6
DOIs
StatePublished - 1999

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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