Fabrication and properties of epitaxial ferroelectric heterostructures with (SrRuO3) isotropic metallic oxide electrodes

C. B. Eom; R. B. Van Dover; Julia M. Phillips; D. J. Werder; J. H. Marshall; C. H. Chen; R. J. Cava; R. M. Fleming; D. K. Fork

doi:10.1063/1.110436

Fabrication and properties of epitaxial ferroelectric heterostructures with (SrRuO₃) isotropic metallic oxide electrodes

C. B. Eom
, R. B. Van Dover
, Julia M. Phillips
, D. J. Werder
, J. H. Marshall
, C. H. Chen
, R. J. Cava
, R. M. Fleming
, D. K. Fork

Research output: Contribution to journal › Article › peer-review

427 Scopus citations

Abstract

Epitaxial ferroelectric SrRuO₃/Pb(Zr_0.52Ti _0.48)O₃/SrRuO₃ heterostructures have been fabricated employing isotropic metallic oxide electrodes on (100) SrTiO ₃ and (100) Si with an yttria stabilized zirconia buffer layer. The structures have been grown in situ by 90°off-axis sputtering, which allows the growth of uniform stoichiometric films over large areas with excellent step coverage. X-ray diffraction, Rutherford backscattering spectroscopy, and cross-sectional transmission electron microscopy reveal high crystalline quality and coherent interfaces. They exhibit superior fatigue characteristics over those made with metal electrodes, showing little degradation over 10 ¹⁰ cycles, with a large remnant polarization.

Original language	English (US)
Pages (from-to)	2570-2572
Number of pages	3
Journal	Applied Physics Letters
Volume	63
Issue number	18
DOIs	https://doi.org/10.1063/1.110436
State	Published - 1993
Externally published	Yes

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.110436

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title = "Fabrication and properties of epitaxial ferroelectric heterostructures with (SrRuO3) isotropic metallic oxide electrodes",

abstract = "Epitaxial ferroelectric SrRuO3/Pb(Zr0.52Ti 0.48)O3/SrRuO3 heterostructures have been fabricated employing isotropic metallic oxide electrodes on (100) SrTiO 3 and (100) Si with an yttria stabilized zirconia buffer layer. The structures have been grown in situ by 90°off-axis sputtering, which allows the growth of uniform stoichiometric films over large areas with excellent step coverage. X-ray diffraction, Rutherford backscattering spectroscopy, and cross-sectional transmission electron microscopy reveal high crystalline quality and coherent interfaces. They exhibit superior fatigue characteristics over those made with metal electrodes, showing little degradation over 10 10 cycles, with a large remnant polarization.",

author = "Eom, \{C. B.\} and \{Van Dover\}, \{R. B.\} and Phillips, \{Julia M.\} and Werder, \{D. J.\} and Marshall, \{J. H.\} and Chen, \{C. H.\} and Cava, \{R. J.\} and Fleming, \{R. M.\} and Fork, \{D. K.\}",

year = "1993",

doi = "10.1063/1.110436",

language = "English (US)",

volume = "63",

pages = "2570--2572",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

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TY - JOUR

T1 - Fabrication and properties of epitaxial ferroelectric heterostructures with (SrRuO3) isotropic metallic oxide electrodes

AU - Eom, C. B.

AU - Van Dover, R. B.

AU - Phillips, Julia M.

AU - Werder, D. J.

AU - Marshall, J. H.

AU - Chen, C. H.

AU - Cava, R. J.

AU - Fleming, R. M.

AU - Fork, D. K.

PY - 1993

Y1 - 1993

N2 - Epitaxial ferroelectric SrRuO3/Pb(Zr0.52Ti 0.48)O3/SrRuO3 heterostructures have been fabricated employing isotropic metallic oxide electrodes on (100) SrTiO 3 and (100) Si with an yttria stabilized zirconia buffer layer. The structures have been grown in situ by 90°off-axis sputtering, which allows the growth of uniform stoichiometric films over large areas with excellent step coverage. X-ray diffraction, Rutherford backscattering spectroscopy, and cross-sectional transmission electron microscopy reveal high crystalline quality and coherent interfaces. They exhibit superior fatigue characteristics over those made with metal electrodes, showing little degradation over 10 10 cycles, with a large remnant polarization.

AB - Epitaxial ferroelectric SrRuO3/Pb(Zr0.52Ti 0.48)O3/SrRuO3 heterostructures have been fabricated employing isotropic metallic oxide electrodes on (100) SrTiO 3 and (100) Si with an yttria stabilized zirconia buffer layer. The structures have been grown in situ by 90°off-axis sputtering, which allows the growth of uniform stoichiometric films over large areas with excellent step coverage. X-ray diffraction, Rutherford backscattering spectroscopy, and cross-sectional transmission electron microscopy reveal high crystalline quality and coherent interfaces. They exhibit superior fatigue characteristics over those made with metal electrodes, showing little degradation over 10 10 cycles, with a large remnant polarization.

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U2 - 10.1063/1.110436

DO - 10.1063/1.110436

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SN - 0003-6951

VL - 63

SP - 2570

EP - 2572

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 18

ER -

Fabrication and properties of epitaxial ferroelectric heterostructures with (SrRuO₃) isotropic metallic oxide electrodes

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