Erratum: Summary Abstract: Aluminum deposition on low-temperature GaAs [J. Vac. Sci. Technol. A 4, 882 (1986)]

M. K. Kelly; Nacira Tache; E. Colavita; G. Maraaritondo; Antoine Kahn

doi:10.1116/1.573726

Erratum: Summary Abstract: Aluminum deposition on low-temperature GaAs [J. Vac. Sci. Technol. A 4, 882 (1986)]

M. K. Kelly, Nacira Tache, E. Colavita, G. Maraaritondo, Antoine Kahn

Research output: Contribution to journal › Comment/debate › peer-review

Original language	English (US)
Pages (from-to)	2539
Number of pages	1
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	4
Issue number	6
DOIs	https://doi.org/10.1116/1.573726
State	Published - Nov 1986

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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10.1116/1.573726

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AU - Kahn, Antoine

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Erratum: Summary Abstract: Aluminum deposition on low-temperature GaAs [J. Vac. Sci. Technol. A 4, 882 (1986)]

All Science Journal Classification (ASJC) codes

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