Elucidating the mechanism of nanocone and nanohole formation on si by optical trap assisted nanopatterning

Ting Hsuan Chen, Yu Cheng Tsai, Romain Fardel, Craig B. Arnold

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Using optical trap-assisted nanopatterning (OTAN), we are able to control the formation of nanocones and nanoholes in Silicon. The effects are described by integrating FDTD and heat transfer modeling to account for the nanoscale features.

Original languageEnglish (US)
Title of host publicationCLEO
Subtitle of host publicationApplications and Technology, CLEO-AT 2015
PublisherOptical Society of America (OSA)
ISBN (Electronic)9781557529688
DOIs
StatePublished - May 4 2015
EventCLEO: Applications and Technology, CLEO-AT 2015 - San Jose, United States
Duration: May 10 2015May 15 2015

Publication series

NameCLEO: Applications and Technology, CLEO-AT 2015

Other

OtherCLEO: Applications and Technology, CLEO-AT 2015
CountryUnited States
CitySan Jose
Period5/10/155/15/15

All Science Journal Classification (ASJC) codes

  • Atomic and Molecular Physics, and Optics
  • Electronic, Optical and Magnetic Materials

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    Chen, T. H., Tsai, Y. C., Fardel, R., & Arnold, C. B. (2015). Elucidating the mechanism of nanocone and nanohole formation on si by optical trap assisted nanopatterning. In CLEO: Applications and Technology, CLEO-AT 2015 [AM2K.6] (CLEO: Applications and Technology, CLEO-AT 2015). Optical Society of America (OSA). https://doi.org/10.1364/CLEO_AT.2015.AM2K.6