Electron, ion and vacuum ultraviolet photon effects in 193 nm photoresist surface roughening

T. Y. Chung, D. Nest, D. B. Graves, F. Weilnboeck, R. L. Bruce, G. S. Oehrlein, D. Wang, M. Li, E. A. Hudson

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

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Engineering