Abstract
The electron beam patterning of crystalline CaF2 and Ca0.5Sr-0.5F2 thin films grown by molecular-beam epitaxy is demonstrated. The mechanism leading to patterning is the removal of fluorine through high energy electron beam exposure and dissolution of the resulting metal oxide in a water-based solution. A scanning Auger microprobe and a scanning electron microscope are used as exposing tools. The development of the films is performed either in deionized water or in a weak HCl solution. The chemical analysis of the patterned features confirms the development of small windows. The feasibility of the fabrication of micrometers features is verified.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 960-964 |
| Number of pages | 5 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 10 |
| Issue number | 4 |
| DOIs | |
| State | Published - Jul 1992 |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films