Abstract
The electron beam patterning of crystalline CaF2 and Ca0.5Sr-0.5F2 thin films grown by molecular-beam epitaxy is demonstrated. The mechanism leading to patterning is the removal of fluorine through high energy electron beam exposure and dissolution of the resulting metal oxide in a water-based solution. A scanning Auger microprobe and a scanning electron microscope are used as exposing tools. The development of the films is performed either in deionized water or in a weak HCl solution. The chemical analysis of the patterned features confirms the development of small windows. The feasibility of the fabrication of micrometers features is verified.
Original language | English (US) |
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Pages (from-to) | 960-964 |
Number of pages | 5 |
Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
Volume | 10 |
Issue number | 4 |
DOIs | |
State | Published - Jul 1992 |
All Science Journal Classification (ASJC) codes
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films