TY - JOUR
T1 - Effects of temperature and surface contamination on D retention in ultrathin Li films on TZM
AU - Capece, A. M.
AU - Roszell, J. P.
AU - Skinner, C. H.
AU - Koel, Bruce E.
N1 - Publisher Copyright:
© 2014 Elsevier B.V.
PY - 2015/7/22
Y1 - 2015/7/22
N2 - Abstract In this work, we investigate deuterium retention at the Mo-Li interface by studying thin Li films three monolayers thick on a TZM Mo alloy. Li films at temperatures between 315 and 460 K were exposed to a deuterium ion beam and D retention was measured using temperature programmed desorption. In the absence of oxygen, D is retained as LiD, and the relative amount of retained D decreases with increasing substrate temperature. In three-monolayer thick lithium oxide films, the amount of D retained was 2.5 times higher than the amount retained as LiD in the metallic Li film. However, oxygen reduces the thermal stability of D in the film, causing D2O and D2 to be released from the surface at temperatures 150-200 K below the LiD decomposition temperature. These results highlight the importance of maintaining a metallic Li layer for high D retention in Li films on TZM at elevated temperatures.
AB - Abstract In this work, we investigate deuterium retention at the Mo-Li interface by studying thin Li films three monolayers thick on a TZM Mo alloy. Li films at temperatures between 315 and 460 K were exposed to a deuterium ion beam and D retention was measured using temperature programmed desorption. In the absence of oxygen, D is retained as LiD, and the relative amount of retained D decreases with increasing substrate temperature. In three-monolayer thick lithium oxide films, the amount of D retained was 2.5 times higher than the amount retained as LiD in the metallic Li film. However, oxygen reduces the thermal stability of D in the film, causing D2O and D2 to be released from the surface at temperatures 150-200 K below the LiD decomposition temperature. These results highlight the importance of maintaining a metallic Li layer for high D retention in Li films on TZM at elevated temperatures.
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U2 - 10.1016/j.jnucmat.2014.10.048
DO - 10.1016/j.jnucmat.2014.10.048
M3 - Article
AN - SCOPUS:84937630236
SN - 0022-3115
VL - 463
SP - 1177
EP - 1180
JO - Journal of Nuclear Materials
JF - Journal of Nuclear Materials
M1 - 48545
ER -