Effects of temperature and surface contamination on D retention in ultrathin Li films on TZM

A. M. Capece, J. P. Roszell, C. H. Skinner, Bruce E. Koel

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Abstract

Abstract In this work, we investigate deuterium retention at the Mo-Li interface by studying thin Li films three monolayers thick on a TZM Mo alloy. Li films at temperatures between 315 and 460 K were exposed to a deuterium ion beam and D retention was measured using temperature programmed desorption. In the absence of oxygen, D is retained as LiD, and the relative amount of retained D decreases with increasing substrate temperature. In three-monolayer thick lithium oxide films, the amount of D retained was 2.5 times higher than the amount retained as LiD in the metallic Li film. However, oxygen reduces the thermal stability of D in the film, causing D2O and D2 to be released from the surface at temperatures 150-200 K below the LiD decomposition temperature. These results highlight the importance of maintaining a metallic Li layer for high D retention in Li films on TZM at elevated temperatures.

Original languageEnglish (US)
Article number48545
Pages (from-to)1177-1180
Number of pages4
JournalJournal of Nuclear Materials
Volume463
DOIs
StatePublished - Jul 22 2015

All Science Journal Classification (ASJC) codes

  • Nuclear and High Energy Physics
  • General Materials Science
  • Nuclear Energy and Engineering

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