Effects of reflective surfaces on silicon emissivity and temperature measurements

Research output: Contribution to journalConference articlepeer-review


The effects of front-side reflective surfaces on the sensitivity and temperature measurement of silicon wafers in a Rapid Thermal Processing chamber with backside heating are examined through optics modeling. Two schemes are contrasted. In (1), the pyrometry detector looks at the backside of the wafer; in (2), it looks at the frontside of the wafer. In both cases, the temperature errors occur when the reflector's reflectivity deviates from unity. However, the error dependence on the reflector reflectivity exhibits interesting differences in these two schemes. Under the working conditions proposed in this paper, a non-ideal reflector introduces a bigger temperature error in the 'backside-detector' scheme than in the 'front-detector' scheme. Practical implications of these results are also discussed.

Original languageEnglish (US)
Pages (from-to)297-302
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
StatePublished - 1996
EventProceedings of the 1996 MRS Spring Symposium - San Francisco, CA, USA
Duration: Apr 8 1996Apr 12 1996

All Science Journal Classification (ASJC) codes

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


Dive into the research topics of 'Effects of reflective surfaces on silicon emissivity and temperature measurements'. Together they form a unique fingerprint.

Cite this