Effect of SiNx gate dielectric deposition power and temperature on a-Si:H TFT stability

Alex Z. Kattamis, Kunigunde H. Cherenack, Bahman Hekmatshoar, I. Chun Cheng, Helena Gleskova, James C. Sturm, Sigard Wagner

Research output: Contribution to journalArticlepeer-review

18 Scopus citations

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Chemical Compounds

Engineering & Materials Science