Effect of plasma treatment on crystallization behavior of amorphous silicon films

Keyphrases

• Amorphous Silicon Thin Film 100%
• Crystallization Behavior 100%
• Plasma Treatment 100%
• Crystallization Kinetics 100%
• Thermal Annealing 50%
• Room Temperature 50%
• Parallel Plates 50%
• Annealing 50%
• A-Si 50%
• Plasma Enhanced 50%
• Amorphous Silicon 50%
• Oxides 50%
• Hydrogen Plasma 50%
• Diode 50%
• Plasma Exposure 50%
• Plasma-enhanced Chemical Vapor Deposition (PECVD) 50%
• Amorphous Crystallization 50%
• Reactive Ions 50%
• Enhanced Crystallization 50%
• Etcher 50%
• Silicon on Insulator Technology 50%

Material Science

• Film 100%
• Amorphous Silicon 100%
• Silicon 50%
• Amorphous Material 50%
• Oxide Compound 50%
• Annealing 50%
• Plasma-Enhanced Chemical Vapor Deposition 50%

Engineering

• Silicon on Insulator Technology 100%