Dynamic modeling and scaling of nanostructure formation in the lithographically induced self-assembly and self-construction

Lin Wu; Stephen Y. Chou

doi:10.1063/1.1572963

Dynamic modeling and scaling of nanostructure formation in the lithographically induced self-assembly and self-construction

Lin Wu
, Stephen Y. Chou

Research output: Contribution to journal › Article › peer-review

54 Scopus citations

Abstract

The scaling and dynamic modelling of nanostructure formation in the lithographically induced self-assembly (LISA) of thin polymer films was discussed. The period of the self-assembled pillars depended on the ratio between the surface tension and the electrostatic force. The pillars remained unaffected by the viscosity of the polymer.

Original language	English (US)
Pages (from-to)	3200-3202
Number of pages	3
Journal	Applied Physics Letters
Volume	82
Issue number	19
DOIs	https://doi.org/10.1063/1.1572963
State	Published - May 12 2003

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.1572963

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title = "Dynamic modeling and scaling of nanostructure formation in the lithographically induced self-assembly and self-construction",

abstract = "The scaling and dynamic modelling of nanostructure formation in the lithographically induced self-assembly (LISA) of thin polymer films was discussed. The period of the self-assembled pillars depended on the ratio between the surface tension and the electrostatic force. The pillars remained unaffected by the viscosity of the polymer.",

author = "Lin Wu and Chou, \{Stephen Y.\}",

year = "2003",

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AU - Chou, Stephen Y.

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N2 - The scaling and dynamic modelling of nanostructure formation in the lithographically induced self-assembly (LISA) of thin polymer films was discussed. The period of the self-assembled pillars depended on the ratio between the surface tension and the electrostatic force. The pillars remained unaffected by the viscosity of the polymer.

AB - The scaling and dynamic modelling of nanostructure formation in the lithographically induced self-assembly (LISA) of thin polymer films was discussed. The period of the self-assembled pillars depended on the ratio between the surface tension and the electrostatic force. The pillars remained unaffected by the viscosity of the polymer.

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UR - https://www.scopus.com/pages/publications/0037981380#tab=citedBy

U2 - 10.1063/1.1572963

DO - 10.1063/1.1572963

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JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 19

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Dynamic modeling and scaling of nanostructure formation in the lithographically induced self-assembly and self-construction

Abstract

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