Directed motion of colloidal particles in a galvanic microreactor

Linda Jan, Christian Punckt, Boris Khusid, Ilhan A. Aksay

Research output: Contribution to journalArticle

2 Scopus citations

Abstract

The mechanisms leading to the deposition of colloidal particles in a copper-gold galvanic microreactor are investigated. Using in situ current density measurements and particle velocimetry, we establish correlations between the spatial arrangement and the geometry of the electrodes, current density distribution, and particle aggregation behavior. Ionic transport phenomena are responsible for the occurrence of strongly localized high current density at the edges and corners of the copper electrodes at large electrode separation, leading to a preferential aggregation of colloidal particles at the electrode edges. Preferential aggregation appears to be the result of a combination of electrophoretic effects and changes in bulk electrolyte flow patterns. We demonstrate that electrolyte flow is most likely driven by electrochemical potential gradients of reaction products formed during the inhomogeneous copper dissolution.

Original languageEnglish (US)
Pages (from-to)2498-2505
Number of pages8
JournalLangmuir
Volume29
Issue number8
DOIs
StatePublished - Feb 26 2013

All Science Journal Classification (ASJC) codes

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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    Jan, L., Punckt, C., Khusid, B., & Aksay, I. A. (2013). Directed motion of colloidal particles in a galvanic microreactor. Langmuir, 29(8), 2498-2505. https://doi.org/10.1021/la303757a