Direct writing of planar ultracapacitors by laser forward transfer processing

Craig B. Arnold, Ryan C. Wartena, Bhanu Pratap, Karen E. Swider-Lyons, Alberto Piqué

Research output: Contribution to journalConference articlepeer-review

10 Scopus citations

Abstract

We employ a novel laser forward transfer process, Matrix Assisted Pulsed Laser Evaporation Direct Write (MAPLE-DW), in combination with ultraviolet laser micromachining, to fabricate mesoscale ultracapacitors and microbatteries under ambient temperature and atmospheric conditions. Our laser engineering approach enables the deposition of hydrous ruthenium oxide (RuOxHy or RuO2 · x H2O) films with the desired high surface area morphology, without compromising the electrochemical performance of this high specific capacitance material. We compare three different deposition formulations incorporating ethylene glycol, glycerol, or sulfuric acid. The best electrochemical performance is achieved using a mixture of sulfuric acid with RuO2 · 0.5 H2O electrode material. Our ultracapacitors exhibit the expected linear discharge behavior under a constant current drain, and the electrochemical properties of these cells scale proportionately when combined in parallel and series.

Original languageEnglish (US)
Pages (from-to)353-360
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4637
DOIs
StatePublished - Jan 1 2002
EventPhoton Processing in Microelectronics and Photonics - San Jose, CA, United States
Duration: Jan 21 2002Jan 24 2002

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Keywords

  • Electrochemical capacitor
  • Hydrous ruthenium oxide
  • Laser direct write
  • Laser micromachining
  • MAPLE-DW
  • Microbattery
  • Pseudocapacitor
  • RuO
  • Supercapacitor

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