Direct writing of planar ultracapacitors by laser forward transfer processing

Craig B. Arnold; Ryan C. Wartena; Bhanu Pratap; Karen E. Swider-Lyons; Alberto Piqué

doi:10.1117/12.470641

Direct writing of planar ultracapacitors by laser forward transfer processing

Craig B. Arnold, Ryan C. Wartena, Bhanu Pratap, Karen E. Swider-Lyons, Alberto Piqué

Research output: Contribution to journal › Conference article › peer-review

13 Scopus citations

Abstract

We employ a novel laser forward transfer process, Matrix Assisted Pulsed Laser Evaporation Direct Write (MAPLE-DW), in combination with ultraviolet laser micromachining, to fabricate mesoscale ultracapacitors and microbatteries under ambient temperature and atmospheric conditions. Our laser engineering approach enables the deposition of hydrous ruthenium oxide (RuO_xH_y or RuO₂ · x H₂O) films with the desired high surface area morphology, without compromising the electrochemical performance of this high specific capacitance material. We compare three different deposition formulations incorporating ethylene glycol, glycerol, or sulfuric acid. The best electrochemical performance is achieved using a mixture of sulfuric acid with RuO₂ · 0.5 H₂O electrode material. Our ultracapacitors exhibit the expected linear discharge behavior under a constant current drain, and the electrochemical properties of these cells scale proportionately when combined in parallel and series.

Original language	English (US)
Pages (from-to)	353-360
Number of pages	8
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	4637
DOIs	https://doi.org/10.1117/12.470641
State	Published - 2002
Event	Photon Processing in Microelectronics and Photonics - San Jose, CA, United States Duration: Jan 21 2002 → Jan 24 2002

All Science Journal Classification (ASJC) codes

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Computer Science Applications
Applied Mathematics
Electrical and Electronic Engineering

Keywords

Electrochemical capacitor
Hydrous ruthenium oxide
Laser direct write
Laser micromachining
MAPLE-DW
Microbattery
Pseudocapacitor
RuO
Supercapacitor

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10.1117/12.470641

Cite this

@article{4fd20a470fde4c1d85e7caf608ec4090,

title = "Direct writing of planar ultracapacitors by laser forward transfer processing",

abstract = "We employ a novel laser forward transfer process, Matrix Assisted Pulsed Laser Evaporation Direct Write (MAPLE-DW), in combination with ultraviolet laser micromachining, to fabricate mesoscale ultracapacitors and microbatteries under ambient temperature and atmospheric conditions. Our laser engineering approach enables the deposition of hydrous ruthenium oxide (RuOxHy or RuO2 · x H2O) films with the desired high surface area morphology, without compromising the electrochemical performance of this high specific capacitance material. We compare three different deposition formulations incorporating ethylene glycol, glycerol, or sulfuric acid. The best electrochemical performance is achieved using a mixture of sulfuric acid with RuO2 · 0.5 H2O electrode material. Our ultracapacitors exhibit the expected linear discharge behavior under a constant current drain, and the electrochemical properties of these cells scale proportionately when combined in parallel and series.",

keywords = "Electrochemical capacitor, Hydrous ruthenium oxide, Laser direct write, Laser micromachining, MAPLE-DW, Microbattery, Pseudocapacitor, RuO, Supercapacitor",

author = "Arnold, {Craig B.} and Wartena, {Ryan C.} and Bhanu Pratap and Swider-Lyons, {Karen E.} and Alberto Piqu{\'e}",

year = "2002",

doi = "10.1117/12.470641",

language = "English (US)",

volume = "4637",

pages = "353--360",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Photon Processing in Microelectronics and Photonics ; Conference date: 21-01-2002 Through 24-01-2002",

}

TY - JOUR

T1 - Direct writing of planar ultracapacitors by laser forward transfer processing

AU - Arnold, Craig B.

AU - Wartena, Ryan C.

AU - Pratap, Bhanu

AU - Swider-Lyons, Karen E.

AU - Piqué, Alberto

PY - 2002

Y1 - 2002

N2 - We employ a novel laser forward transfer process, Matrix Assisted Pulsed Laser Evaporation Direct Write (MAPLE-DW), in combination with ultraviolet laser micromachining, to fabricate mesoscale ultracapacitors and microbatteries under ambient temperature and atmospheric conditions. Our laser engineering approach enables the deposition of hydrous ruthenium oxide (RuOxHy or RuO2 · x H2O) films with the desired high surface area morphology, without compromising the electrochemical performance of this high specific capacitance material. We compare three different deposition formulations incorporating ethylene glycol, glycerol, or sulfuric acid. The best electrochemical performance is achieved using a mixture of sulfuric acid with RuO2 · 0.5 H2O electrode material. Our ultracapacitors exhibit the expected linear discharge behavior under a constant current drain, and the electrochemical properties of these cells scale proportionately when combined in parallel and series.

AB - We employ a novel laser forward transfer process, Matrix Assisted Pulsed Laser Evaporation Direct Write (MAPLE-DW), in combination with ultraviolet laser micromachining, to fabricate mesoscale ultracapacitors and microbatteries under ambient temperature and atmospheric conditions. Our laser engineering approach enables the deposition of hydrous ruthenium oxide (RuOxHy or RuO2 · x H2O) films with the desired high surface area morphology, without compromising the electrochemical performance of this high specific capacitance material. We compare three different deposition formulations incorporating ethylene glycol, glycerol, or sulfuric acid. The best electrochemical performance is achieved using a mixture of sulfuric acid with RuO2 · 0.5 H2O electrode material. Our ultracapacitors exhibit the expected linear discharge behavior under a constant current drain, and the electrochemical properties of these cells scale proportionately when combined in parallel and series.

KW - Electrochemical capacitor

KW - Hydrous ruthenium oxide

KW - Laser direct write

KW - Laser micromachining

KW - MAPLE-DW

KW - Microbattery

KW - Pseudocapacitor

KW - RuO

KW - Supercapacitor

UR - http://www.scopus.com/inward/record.url?scp=0036406735&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0036406735&partnerID=8YFLogxK

U2 - 10.1117/12.470641

DO - 10.1117/12.470641

M3 - Conference article

AN - SCOPUS:0036406735

SN - 0277-786X

VL - 4637

SP - 353

EP - 360

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

T2 - Photon Processing in Microelectronics and Photonics

Y2 - 21 January 2002 through 24 January 2002

ER -

Direct writing of planar ultracapacitors by laser forward transfer processing

Abstract

All Science Journal Classification (ASJC) codes

Keywords

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