Direct three-dimensional patterning using nanoimprint lithography

Mingtao Li; Lei Chen; Stephen Y. Chou

doi:10.1063/1.1375006

Direct three-dimensional patterning using nanoimprint lithography

Mingtao Li, Lei Chen, Stephen Y. Chou

Research output: Contribution to journal › Article › peer-review

119 Scopus citations

Abstract

We demonstrated that nanoimprint lithography (NIL) can create three-dimensional patterns, sub-40 nm T-gates, and air-bridge structures, in a single step imprint in polymer and metal by lift-off. A method based on electron beam lithography and reactive ion etching was developed to fabricate NIL molds with three-dimensional protrusions. The low-cost and high-throughput nanoimprint lithography for three-dimensional nanostructures has many significant applications such as monolithic microwave integrated circuits and nanoelectromechanical system.

Original language	English (US)
Pages (from-to)	3322-3324
Number of pages	3
Journal	Applied Physics Letters
Volume	78
Issue number	21
DOIs	https://doi.org/10.1063/1.1375006
State	Published - May 21 2001

All Science Journal Classification (ASJC) codes

Physics and Astronomy (miscellaneous)

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10.1063/1.1375006

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abstract = "We demonstrated that nanoimprint lithography (NIL) can create three-dimensional patterns, sub-40 nm T-gates, and air-bridge structures, in a single step imprint in polymer and metal by lift-off. A method based on electron beam lithography and reactive ion etching was developed to fabricate NIL molds with three-dimensional protrusions. The low-cost and high-throughput nanoimprint lithography for three-dimensional nanostructures has many significant applications such as monolithic microwave integrated circuits and nanoelectromechanical system.",

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year = "2001",

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AU - Chen, Lei

AU - Chou, Stephen Y.

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N2 - We demonstrated that nanoimprint lithography (NIL) can create three-dimensional patterns, sub-40 nm T-gates, and air-bridge structures, in a single step imprint in polymer and metal by lift-off. A method based on electron beam lithography and reactive ion etching was developed to fabricate NIL molds with three-dimensional protrusions. The low-cost and high-throughput nanoimprint lithography for three-dimensional nanostructures has many significant applications such as monolithic microwave integrated circuits and nanoelectromechanical system.

AB - We demonstrated that nanoimprint lithography (NIL) can create three-dimensional patterns, sub-40 nm T-gates, and air-bridge structures, in a single step imprint in polymer and metal by lift-off. A method based on electron beam lithography and reactive ion etching was developed to fabricate NIL molds with three-dimensional protrusions. The low-cost and high-throughput nanoimprint lithography for three-dimensional nanostructures has many significant applications such as monolithic microwave integrated circuits and nanoelectromechanical system.

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JO - Applied Physics Letters

JF - Applied Physics Letters

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ER -

Direct three-dimensional patterning using nanoimprint lithography

Abstract

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