Direct three-dimensional patterning using nanoimprint lithography

Mingtao Li, Lei Chen, Stephen Y. Chou

Research output: Contribution to journalArticlepeer-review

116 Scopus citations


We demonstrated that nanoimprint lithography (NIL) can create three-dimensional patterns, sub-40 nm T-gates, and air-bridge structures, in a single step imprint in polymer and metal by lift-off. A method based on electron beam lithography and reactive ion etching was developed to fabricate NIL molds with three-dimensional protrusions. The low-cost and high-throughput nanoimprint lithography for three-dimensional nanostructures has many significant applications such as monolithic microwave integrated circuits and nanoelectromechanical system.

Original languageEnglish (US)
Pages (from-to)3322-3324
Number of pages3
JournalApplied Physics Letters
Issue number21
StatePublished - May 21 2001

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy (miscellaneous)


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