Direct mask-free patterning of molecular organic semiconductors using organic vapor jet printing

Max Shtein, Peter Peumans, Jay Burton Benziger, Stephen R. Forrest

Research output: Contribution to journalArticle

33 Scopus citations

Abstract

Direct mask-free patterning of molecular organic semiconductors was analyzed using organic vapor jet printing. Organic molecules were sublimated into a hot inert carrier gas and expanded through microscopic nozzles resulting in a highly collimated gas jet. The jet impinging on a cooled substrate, formed a thin film deposit whose lateral extent was controlled by the nozzle diameter, nozzle-to-substrate separation, and the downstream ambient pressure. It was found that due to the sudden change in the flow direction upon exiting the nozzle and the resulting kinetic impact of the jet on the substrate, the local dynamic pressure in the region between the nozzle and the substrate exceeded P L.

Original languageEnglish (US)
Pages (from-to)4500-4507
Number of pages8
JournalJournal of Applied Physics
Volume96
Issue number8
DOIs
StatePublished - Oct 15 2004

All Science Journal Classification (ASJC) codes

  • Physics and Astronomy(all)

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