Development and operation of research-scale III-V nanowire growth reactors

M. D. Schroer, S. Y. Xu, A. M. Bergman, J. R. Petta

Research output: Contribution to journalArticle

10 Scopus citations

Abstract

III-V nanowires are useful platforms for studying the electronic and mechanical properties of materials at the nanometer scale. However, the costs associated with commercial nanowire growth reactors are prohibitive for most research groups. We developed hot-wall and cold-wall metal organic vapor phase epitaxy reactors for the growth of InAs nanowires, which both use the same gas handling system. The hot-wall reactor is based on an inexpensive quartz tube furnace and yields InAs nanowires for a narrow range of operating conditions. Improvement of crystal quality and an increase in growth run to growth run reproducibility are obtained using a homebuilt UHV cold-wall reactor with a base pressure of 2× 10-9 Torr. A load lock on the UHV reactor prevents the growth chamber from being exposed to atmospheric conditions during sample transfers. Nanowires grown in the cold-wall system have a low defect density, as determined using transmission electron microscopy, and exhibit field effect gating with mobilities approaching 16 000 cm2 / (V s).

Original languageEnglish (US)
Article number023903
JournalReview of Scientific Instruments
Volume81
Issue number2
DOIs
StatePublished - Mar 16 2010

All Science Journal Classification (ASJC) codes

  • Instrumentation

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