TY - JOUR
T1 - Deuterium retention behaviors of boronization films at DIII-D divertor surface
AU - Abe, Shota
AU - Simmonds, Michael J.
AU - Bortolon, Alessandro
AU - Effenberg, Florian
AU - Bykov, Igor
AU - Ren, Jun
AU - Rudakov, Dmitry L.
AU - Hood, Ryan
AU - Hyatt, Alan W.
AU - Lin, Zihan
AU - Abrams, Tyler
N1 - Publisher Copyright:
© 2024
PY - 2025/3
Y1 - 2025/3
N2 - Boron coating of plasma-facing components (PFCs) is widely used in fusion devices to form surface coatings and chemical compounds on the PFCs, thus suppressing plasma contamination by impurities such as oxygen, carbon, and tungsten. Understanding the processes of hydrogenic species retention is crucial to assessing the viability of boron coating techniques in ITER and beyond. In this work, we deposited boronization films on silicon crystal and ITER-grade tungsten samples using a glow discharge boronization plasma of helium (He, 20 %) and diborane (B2D6, 80 %) in the DIII-D tokamak at the heated vessel temperature of 600 K. We performed post-mortem analysis of DIII-D boronization films for thickness utilizing a focused ion beam, deuterium retention utilizing thermal desorption spectroscopy (TDS), and chemical characterization utilizing X-ray photoelectron spectroscopy and Raman spectroscopy. The DIII-D boronization films were exposed to DIII-D tokamak L-, H-mode, and/or PISCES-E linear device D plasmas. We observed a D uptake for B:D = 5:2 in the DIII-D boronization film before D plasma exposures. The observed D retention was mainly in the B[sbnd]C[sbnd]D bond with a desorption peak of 1000 K. No B-D bond with a desorption peak around 700 K was found in the TDS spectrum as the DIII-D vessel was heated to 600 K. Exposures to both DIII-D L- and H-mode D plasma, which includes 1–3 % of C ion contamination, on the DIII-D boronization film at ∼400 K gave a D uptake increase of ∼20 %. Contrarily, D removal by ∼30 % was observed after exposing the DIII-D boronization film to a carbon-free PISCES-E D plasma. This implies that future fusion devices should be careful to minimize C impurity contamination to reduce D retention.
AB - Boron coating of plasma-facing components (PFCs) is widely used in fusion devices to form surface coatings and chemical compounds on the PFCs, thus suppressing plasma contamination by impurities such as oxygen, carbon, and tungsten. Understanding the processes of hydrogenic species retention is crucial to assessing the viability of boron coating techniques in ITER and beyond. In this work, we deposited boronization films on silicon crystal and ITER-grade tungsten samples using a glow discharge boronization plasma of helium (He, 20 %) and diborane (B2D6, 80 %) in the DIII-D tokamak at the heated vessel temperature of 600 K. We performed post-mortem analysis of DIII-D boronization films for thickness utilizing a focused ion beam, deuterium retention utilizing thermal desorption spectroscopy (TDS), and chemical characterization utilizing X-ray photoelectron spectroscopy and Raman spectroscopy. The DIII-D boronization films were exposed to DIII-D tokamak L-, H-mode, and/or PISCES-E linear device D plasmas. We observed a D uptake for B:D = 5:2 in the DIII-D boronization film before D plasma exposures. The observed D retention was mainly in the B[sbnd]C[sbnd]D bond with a desorption peak of 1000 K. No B-D bond with a desorption peak around 700 K was found in the TDS spectrum as the DIII-D vessel was heated to 600 K. Exposures to both DIII-D L- and H-mode D plasma, which includes 1–3 % of C ion contamination, on the DIII-D boronization film at ∼400 K gave a D uptake increase of ∼20 %. Contrarily, D removal by ∼30 % was observed after exposing the DIII-D boronization film to a carbon-free PISCES-E D plasma. This implies that future fusion devices should be careful to minimize C impurity contamination to reduce D retention.
KW - Boron
KW - Boronization
KW - DIII-D
KW - Hydrogen retention
KW - Plasma-material interaction
KW - Tritium
UR - https://www.scopus.com/pages/publications/85213527931
UR - https://www.scopus.com/inward/citedby.url?scp=85213527931&partnerID=8YFLogxK
U2 - 10.1016/j.nme.2024.101855
DO - 10.1016/j.nme.2024.101855
M3 - Article
AN - SCOPUS:85213527931
SN - 2352-1791
VL - 42
JO - Nuclear Materials and Energy
JF - Nuclear Materials and Energy
M1 - 101855
ER -