Depth distributions of low energy deuterium implanted into silicon as determined by sims

Chemistry

• Silicon 100%
• Deuterium(.) 100%
• Single Crystalline Solid 33%
• Secondary Ion Mass Spectroscopy 33%
• Depth Profiling 33%

Keyphrases

• Silicon Target 33%
• Sputtering Process 33%
• Atomic Mixing 33%