Demonstration of an isolated buried channel field-effect transistor fabricated via in situ patterned electron-beam deposition of Si in GaAs
- A. P. Mills
- , M. Hong
- , J. P. Mannaerts
- , L. N. Pfeiffer
- , K. W. West
- , S. Martin
- , R. R. Ruel
- , K. W. Baldwin
- , J. E. Rowe
Research output: Contribution to journal › Article › peer-review