C4F8 dissociation in an inductively coupled plasma

M. T. Radtke, J. W. Coburn, David B. Graves

Research output: Contribution to journalArticlepeer-review

12 Scopus citations

Abstract

A proposed cross section for c-C4F8 total dissociation was tested in dilute c-C4F8/Ar plasma. A Langmuir probe was used to make EEDF measurements and the total dissociation rate coefficient was calculated by integrating the total dissociation cross section over the measured EEPFs. The total dissociation rate coefficient was independently calculated using a reactor mass balance and measured c-C4F8 density. Comparison between the rate coefficients calculated by the two methods indicates that the proposed cross sections were accurate within model and experimental uncertainties.

Original languageEnglish (US)
Pages (from-to)1038-1047
Number of pages10
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume21
Issue number4
DOIs
StatePublished - Jul 2003
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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