Crystallographic etching of few-layer graphene

Sujit S. Datta; Douglas R. Strachan; Samuel M. Khamis; A. T.Charlie Johnson

doi:10.1021/nl080583r

Crystallographic etching of few-layer graphene

Sujit S. Datta, Douglas R. Strachan, Samuel M. Khamis, A. T.Charlie Johnson

Research output: Contribution to journal › Article › peer-review

484 Scopus citations

Abstract

We demonstrate a method by which few-layer graphene samples can be etched along crystallographic axes by thermally activated metallic nanoparticles. The technique results in long (>1 μm) crystallographic edges etched through to the insulating substrate, making the process potentially useful for atomically precise graphene device fabrication. This advance could enable atomically precise construction of integrated circuits from single graphene sheets with a wide range of technological applications.

Original language	English (US)
Pages (from-to)	1912-1915
Number of pages	4
Journal	Nano Letters
Volume	8
Issue number	7
DOIs	https://doi.org/10.1021/nl080583r
State	Published - Jul 2008
Externally published	Yes

All Science Journal Classification (ASJC) codes

Condensed Matter Physics
Mechanical Engineering
Bioengineering
Chemistry(all)
Materials Science(all)

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10.1021/nl080583r

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title = "Crystallographic etching of few-layer graphene",

abstract = "We demonstrate a method by which few-layer graphene samples can be etched along crystallographic axes by thermally activated metallic nanoparticles. The technique results in long (>1 μm) crystallographic edges etched through to the insulating substrate, making the process potentially useful for atomically precise graphene device fabrication. This advance could enable atomically precise construction of integrated circuits from single graphene sheets with a wide range of technological applications.",

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AU - Khamis, Samuel M.

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AB - We demonstrate a method by which few-layer graphene samples can be etched along crystallographic axes by thermally activated metallic nanoparticles. The technique results in long (>1 μm) crystallographic edges etched through to the insulating substrate, making the process potentially useful for atomically precise graphene device fabrication. This advance could enable atomically precise construction of integrated circuits from single graphene sheets with a wide range of technological applications.

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JO - Nano Letters

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Crystallographic etching of few-layer graphene

Abstract

All Science Journal Classification (ASJC) codes

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