TY - JOUR
T1 - Control of Ion Species and Energy in High-Flux Helicon-Wave-Excited Plasma Using Ar/N2 Gas Mixtures
AU - Huang, Tianyuan
AU - Jin, Chenggang
AU - Yang, Yan
AU - Wu, Xuemei
AU - Zhuge, Lanjian
AU - Wang, Qinhua
AU - Ji, Hantao
N1 - Funding Information:
Manuscript received October 18, 2017; revised January 29, 2018; accepted February 20, 2018. Date of publication March 26, 2018; date of current version April 10, 2018. This work was supported in part by the National Natural Science Foundation of China under Grant 11505123, Grant 11435009, Grant 11375126, in part by the National Magnetic Confinement Fusion Science Program of China under Contract 2014GB106005, and in part by the Priority Academic Program under Grant 156455. The review of this paper was arranged by Senior Editor F. Taccogna. (Corresponding author: Chenggang Jin.) T. Huang, Y. Yang, X. Wu, and Q. Wang are with the College of Physics, Optoelectronics and Energy & Collaborative Innovation Center, Suzhou Nano Science and Technology, Soochow University, Suzhou 215006, China, and with the Key Laboratory of Advanced Optical Manufacturing Technologies of Jiangsu Province, Soochow University, Suzhou 215006, China, and also with the Key Laboratory of Modern Optical Technologies of Education Ministry of China, Soochow University, Suzhou 215006, China.
Publisher Copyright:
© 1973-2012 IEEE.
PY - 2018/4
Y1 - 2018/4
N2 - The atomic nitrogen (N) ion flux and impacting ion energy are the two important parameters, which influence the performance of production of plasma nitridation applications such as N-doped graphene. In this paper, a novel method is described to control the flux and ion energy of atomic N ion (N+) and molecular N2 ion (N2+) using a helicon-wave-excited plasma (HWP) with Ar/N2 gas mixtures. It shows that by varying the flow-rate ratio of N2/(N2+Ar) (α ), the ratio of [N+]/[N2+] ( β ) can be controlled obviously, and β could be increased up to 1.2 at α = 0.5 , which is much higher than that in pure N2 HWP discharge (β ∼ 0.2). The maximum density and flux of atomic N+ are obtained, which are 2.5× 1018 m-3 and 8.6 × 1021, m-2s-1, respectively. The results show that the addition of Ar into N2 plasma can be employed to remarkably increase the [N+]/[N2+] due to electron-impact ionization involving the metastable state of Ar. The N+ ion beams are formed with a speed near to Mach 3, and the ion-beam energy is increased from 30 to 50 eV with increasing α to 0.75.
AB - The atomic nitrogen (N) ion flux and impacting ion energy are the two important parameters, which influence the performance of production of plasma nitridation applications such as N-doped graphene. In this paper, a novel method is described to control the flux and ion energy of atomic N ion (N+) and molecular N2 ion (N2+) using a helicon-wave-excited plasma (HWP) with Ar/N2 gas mixtures. It shows that by varying the flow-rate ratio of N2/(N2+Ar) (α ), the ratio of [N+]/[N2+] ( β ) can be controlled obviously, and β could be increased up to 1.2 at α = 0.5 , which is much higher than that in pure N2 HWP discharge (β ∼ 0.2). The maximum density and flux of atomic N+ are obtained, which are 2.5× 1018 m-3 and 8.6 × 1021, m-2s-1, respectively. The results show that the addition of Ar into N2 plasma can be employed to remarkably increase the [N+]/[N2+] due to electron-impact ionization involving the metastable state of Ar. The N+ ion beams are formed with a speed near to Mach 3, and the ion-beam energy is increased from 30 to 50 eV with increasing α to 0.75.
KW - Helicon-wave-excited plasma (HWP)
KW - high-flux atomic nitrogen ion
KW - ion energy distributions
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U2 - 10.1109/TPS.2018.2812863
DO - 10.1109/TPS.2018.2812863
M3 - Article
AN - SCOPUS:85044371602
SN - 0093-3813
VL - 46
SP - 895
EP - 899
JO - IEEE Transactions on Plasma Science
JF - IEEE Transactions on Plasma Science
IS - 4
ER -