Comparison study of the influence of taller electron exit barriers on the device performance for ultra-strong coupling Quantum Cascade laser designs

Peter Q. Liu, Pierre Bouzi, Yamac Dikmelik, Nyan Lynn Aung, Xiaojun Wang, Jen Yu Fan, Claire F. Gmachl

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Two different ultra-strong coupling Quantum Cascade laser designs and their modified versions with two taller electron exit barriers are compared experimentally to study the influence of such taller electron exit barriers on the device performance.

Original languageEnglish (US)
Title of host publication2012 Conference on Lasers and Electro-Optics, CLEO 2012
StatePublished - Dec 6 2012
Event2012 Conference on Lasers and Electro-Optics, CLEO 2012 - San Jose, CA, United States
Duration: May 6 2012May 11 2012

Other

Other2012 Conference on Lasers and Electro-Optics, CLEO 2012
CountryUnited States
CitySan Jose, CA
Period5/6/125/11/12

All Science Journal Classification (ASJC) codes

  • Electronic, Optical and Magnetic Materials

Fingerprint Dive into the research topics of 'Comparison study of the influence of taller electron exit barriers on the device performance for ultra-strong coupling Quantum Cascade laser designs'. Together they form a unique fingerprint.

  • Cite this

    Liu, P. Q., Bouzi, P., Dikmelik, Y., Aung, N. L., Wang, X., Fan, J. Y., & Gmachl, C. F. (2012). Comparison study of the influence of taller electron exit barriers on the device performance for ultra-strong coupling Quantum Cascade laser designs. In 2012 Conference on Lasers and Electro-Optics, CLEO 2012 [6325498]