Comparison of high mobility AlGaN/GaN heterostructures grown by MBE on HVPE GaN templates and directly nucleated on sapphire

  • M. J. Manfra
  • , N. G. Weimann
  • , J. W.P. Hsu
  • , L. N. Pfeiffer
  • , K. W. West
  • , R. J. Molnar

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We compare molecular beam epitaxy growth of high electron mobility AlGaN/GaN heterostructures grown homoepitaxially on semi-insulating (SI) GaN templates prepared by hydride vapor phase epitaxy (HVPE) with structures grown completely by MBE on sapphire substrates. The quality of our MBE grown AlGaN/GaN heterostructures on HVPE templates has been proven by a record low temperature two-dimensional electron gas (2DEG) mobility of 75,000 cm2/Vs at T=4.2 K. Recently, we have developed Zn-compensated HVPE GaN templates that are highly resistive at room temperature (ρ∼108Ωcm). MBE grown heterostructures grown on SI HVPE GaN are electrically isolated from the substrate at all temperatures from 300 K down to T=4.2 K. We report on the first high electron mobility transistors (HEMTs) grown by MBE on a HVPE GaN template.

Original languageEnglish (US)
Title of host publicationMBE 2002 - 2002 12th International Conference on Molecular Beam Epitaxy
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages231-232
Number of pages2
ISBN (Electronic)0780375815, 9780780375819
DOIs
StatePublished - 2002
Externally publishedYes
Event12th International Conference on Molecular Beam Epitaxy, MBE 2002 - San Francisco, United States
Duration: Sep 15 2002Sep 20 2002

Publication series

NameMBE 2002 - 2002 12th International Conference on Molecular Beam Epitaxy

Conference

Conference12th International Conference on Molecular Beam Epitaxy, MBE 2002
Country/TerritoryUnited States
CitySan Francisco
Period9/15/029/20/02

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry

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