Comparison of high mobility AlGaN/GaN heterostructures grown by MBE on HVPE GaN templates and directly nucleated on sapphire

M. J. Manfra, N. G. Weimann, J. W.P. Hsu, L. N. Pfeiffer, K. W. West, R. J. Molnar

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We compare molecular beam epitaxy growth of high electron mobility AlGaN/GaN heterostructures grown homoepitaxially on semi-insulating (SI) GaN templates prepared by hydride vapor phase epitaxy (HVPE) with structures grown completely by MBE on sapphire substrates. The quality of our MBE grown AlGaN/GaN heterostructures on HVPE templates has been proven by a record low temperature two-dimensional electron gas (2DEG) mobility of 75,000 cm2/Vs at T=4.2 K. Recently, we have developed Zn-compensated HVPE GaN templates that are highly resistive at room temperature (ρ∼108Ωcm). MBE grown heterostructures grown on SI HVPE GaN are electrically isolated from the substrate at all temperatures from 300 K down to T=4.2 K. We report on the first high electron mobility transistors (HEMTs) grown by MBE on a HVPE GaN template.

Original languageEnglish (US)
Title of host publicationMBE 2002 - 2002 12th International Conference on Molecular Beam Epitaxy
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages231-232
Number of pages2
ISBN (Electronic)0780375815, 9780780375819
DOIs
StatePublished - 2002
Externally publishedYes
Event12th International Conference on Molecular Beam Epitaxy, MBE 2002 - San Francisco, United States
Duration: Sep 15 2002Sep 20 2002

Publication series

NameMBE 2002 - 2002 12th International Conference on Molecular Beam Epitaxy

Conference

Conference12th International Conference on Molecular Beam Epitaxy, MBE 2002
Country/TerritoryUnited States
CitySan Francisco
Period9/15/029/20/02

All Science Journal Classification (ASJC) codes

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Materials Chemistry

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