Coherent, atomically thin transition-metal dichalcogenide superlattices with engineered strain

Saien Xie, Lijie Tu, Yimo Han, Lujie Huang, Kibum Kang, Ka Un Lao, Preeti Poddar, Chibeom Park, David A. Muller, Robert A. DiStasio, Jiwoong Park

Research output: Contribution to journalArticlepeer-review

165 Scopus citations

Abstract

Epitaxy forms the basis of modern electronics and optoelectronics. We report coherent atomically thin superlattices in which different transition metal dichalcogenide monolayers—despite large lattice mismatches—are repeated and laterally integrated without dislocations within the monolayer plane. Grown by an omnidirectional epitaxy, these superlattices display fully matched lattice constants across heterointerfaces while maintaining an isotropic lattice structure and triangular symmetry. This strong epitaxial strain is precisely engineered via the nanoscale supercell dimensions, thereby enabling broad tuning of the optical properties and producing photoluminescence peak shifts as large as 250 millielectron volts. We present theoretical models to explain this coherent growth and the energetic interplay governing the ripple formation in these strained monolayers. Such coherent superlattices provide building blocks with targeted functionalities at the atomically thin limit.

Original languageEnglish (US)
Pages (from-to)1131-1136
Number of pages6
JournalScience
Volume359
Issue number6380
DOIs
StatePublished - Mar 9 2018
Externally publishedYes

All Science Journal Classification (ASJC) codes

  • General

Fingerprint

Dive into the research topics of 'Coherent, atomically thin transition-metal dichalcogenide superlattices with engineered strain'. Together they form a unique fingerprint.

Cite this