TY - GEN
T1 - Characteristics of plasma decay in dual pulse energy deposition for air and nitrogen in atmospheric pressure
AU - Bak, Junhwi
AU - Pokharel, Sagar
AU - Grunbok, Chris
AU - Rincon, Gerardo Urdaneta
AU - Hadden, Hunter
AU - Tropina, Albina
AU - Dogariu, Arthur
AU - Miles, Richard
N1 - Publisher Copyright:
© 2024, American Institute of Aeronautics and Astronautics Inc, AIAA. All rights reserved.
PY - 2024
Y1 - 2024
N2 - Understanding air plasma is of great interest in various applications including directed energy systems, air-breathing plasma propulsion, and atmospheric plasma sources. In this work, we investigate plasma decay characteristics in a dual pulse energy deposition scheme, where initial pre-ionization is achieved with a femtosecond laser pulse and subsequent energy addition is made with a secondary nanosecond laser pulse. A plasma filament is generated at atmospheric pressure in a N2-O2 gas mixture with varying oxygen concentrations from 0% to 20%. The results show that as O2 concentration increases, the early initial plasma decay on a nanosecond scale slows down. However, following the initial decay - over the scale of tens of nanoseconds - the decay accelerates, becoming faster than in the O2-0% case. Theoretical fits accounting for two-body and three-body recombination reveal enhanced two-body process and suppressed three-body process with increasing O2 concentration. In the dual pulse energy deposition, we find that the addition of O2 slows electron decay through associative ionization and photo-detachment processes.
AB - Understanding air plasma is of great interest in various applications including directed energy systems, air-breathing plasma propulsion, and atmospheric plasma sources. In this work, we investigate plasma decay characteristics in a dual pulse energy deposition scheme, where initial pre-ionization is achieved with a femtosecond laser pulse and subsequent energy addition is made with a secondary nanosecond laser pulse. A plasma filament is generated at atmospheric pressure in a N2-O2 gas mixture with varying oxygen concentrations from 0% to 20%. The results show that as O2 concentration increases, the early initial plasma decay on a nanosecond scale slows down. However, following the initial decay - over the scale of tens of nanoseconds - the decay accelerates, becoming faster than in the O2-0% case. Theoretical fits accounting for two-body and three-body recombination reveal enhanced two-body process and suppressed three-body process with increasing O2 concentration. In the dual pulse energy deposition, we find that the addition of O2 slows electron decay through associative ionization and photo-detachment processes.
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U2 - 10.2514/6.2024-3725
DO - 10.2514/6.2024-3725
M3 - Conference contribution
AN - SCOPUS:85203013262
SN - 9781624107160
T3 - AIAA Aviation Forum and ASCEND, 2024
BT - AIAA Aviation Forum and ASCEND, 2024
PB - American Institute of Aeronautics and Astronautics Inc, AIAA
T2 - AIAA Aviation Forum and ASCEND, 2024
Y2 - 29 July 2024 through 2 August 2024
ER -